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Statements

Subject Item
n2:RIV%2F00216208%3A11320%2F01%3A00105848%21RIV%2F2002%2FGA0%2F113202%2FN
rdf:type
n10:Vysledek skos:Concept
dcterms:description
Influence of C atom concentration for acetylene production in a CH4/N2 afterglow: a numerical simulation Influence of C atom concentration for acetylene production in a CH4/N2 afterglow: a numerical simulation
dcterms:title
Influence of C atom concentration for acetylene production in a CH4/N2 afterglow: a numerical simulation Influence of C atom concentration for acetylene production in a CH4/N2 afterglow: a numerical simulation
skos:prefLabel
Influence of C atom concentration for acetylene production in a CH4/N2 afterglow: a numerical simulation Influence of C atom concentration for acetylene production in a CH4/N2 afterglow: a numerical simulation
skos:notation
RIV/00216208:11320/01:00105848!RIV/2002/GA0/113202/N
n3:strany
403;407
n3:aktivita
n5:P n5:Z
n3:aktivity
P(GA202/98/P246), P(OK 409), Z(MSM 113200002)
n3:cisloPeriodika
2-4
n3:dodaniDat
n8:2002
n3:domaciTvurceVysledku
n17:4128710 n17:9819118
n3:druhVysledku
n19:J
n3:duvernostUdaju
n11:S
n3:entitaPredkladatele
n4:predkladatel
n3:idSjednocenehoVysledku
682753
n3:idVysledku
RIV/00216208:11320/01:00105848
n3:jazykVysledku
n18:eng
n3:klicovaSlova
Influence;concentration;acetylene;production;CH4/N2;afterglow;numerical;simulation
n3:klicoveSlovo
n6:numerical n6:production n6:afterglow n6:Influence n6:acetylene n6:concentration n6:CH4%2FN2 n6:simulation
n3:kodStatuVydavatele
NL - Nizozemsko
n3:kontrolniKodProRIV
[7D29F312AB30]
n3:nazevZdroje
Vacuum
n3:obor
n15:BL
n3:pocetDomacichTvurcuVysledku
2
n3:pocetTvurcuVysledku
4
n3:pocetUcastnikuAkce
0
n3:pocetZahranicnichUcastnikuAkce
0
n3:projekt
n13:OK%20409 n13:GA202%2F98%2FP246
n3:rokUplatneniVysledku
n8:2001
n3:svazekPeriodika
61
n3:tvurceVysledku
Hrach, Rudolf Hrachová, Věra
n3:zamer
n9:MSM%20113200002
s:issn
0042-207X
s:numberOfPages
5
n7:organizacniJednotka
11320