This HTML5 document contains 50 embedded RDF statements represented using HTML+Microdata notation.

The embedded RDF content will be recognized by any processor of HTML5 Microdata.

Namespace Prefixes

PrefixIRI
dctermshttp://purl.org/dc/terms/
n3http://localhost/temp/predkladatel/
n7http://linked.opendata.cz/resource/domain/vavai/riv/tvurce/
n6http://linked.opendata.cz/resource/domain/vavai/projekt/
n19http://linked.opendata.cz/ontology/domain/vavai/
n11http://linked.opendata.cz/resource/domain/vavai/vysledek/RIV%2F00216208%3A11320%2F01%3A00105681%21RIV%2F2002%2FGA0%2F113202%2FN/
n18http://linked.opendata.cz/resource/domain/vavai/zamer/
shttp://schema.org/
skoshttp://www.w3.org/2004/02/skos/core#
n5http://linked.opendata.cz/ontology/domain/vavai/riv/
n2http://linked.opendata.cz/resource/domain/vavai/vysledek/
rdfhttp://www.w3.org/1999/02/22-rdf-syntax-ns#
n13http://linked.opendata.cz/ontology/domain/vavai/riv/klicoveSlovo/
n14http://linked.opendata.cz/ontology/domain/vavai/riv/duvernostUdaju/
xsdhhttp://www.w3.org/2001/XMLSchema#
n15http://linked.opendata.cz/ontology/domain/vavai/riv/aktivita/
n8http://linked.opendata.cz/ontology/domain/vavai/riv/jazykVysledku/
n17http://linked.opendata.cz/ontology/domain/vavai/riv/druhVysledku/
n16http://linked.opendata.cz/ontology/domain/vavai/riv/obor/
n10http://reference.data.gov.uk/id/gregorian-year/

Statements

Subject Item
n2:RIV%2F00216208%3A11320%2F01%3A00105681%21RIV%2F2002%2FGA0%2F113202%2FN
rdf:type
skos:Concept n19:Vysledek
dcterms:description
Characterization of Rh films deposited onto Al2O3 substrate by means of electron spectroscopy Characterization of Rh films deposited onto Al2O3 substrate by means of electron spectroscopy
dcterms:title
Characterization of Rh films deposited onto Al2O3 substrate by means of electron spectroscopy Characterization of Rh films deposited onto Al2O3 substrate by means of electron spectroscopy
skos:prefLabel
Characterization of Rh films deposited onto Al2O3 substrate by means of electron spectroscopy Characterization of Rh films deposited onto Al2O3 substrate by means of electron spectroscopy
skos:notation
RIV/00216208:11320/01:00105681!RIV/2002/GA0/113202/N
n5:strany
83;89
n5:aktivita
n15:Z n15:P
n5:aktivity
P(GA202/99/1714), P(VS97116), Z(MSM 113200002)
n5:cisloPeriodika
1-2
n5:dodaniDat
n10:2002
n5:domaciTvurceVysledku
n7:3283968 n7:2487373
n5:druhVysledku
n17:J
n5:duvernostUdaju
n14:S
n5:entitaPredkladatele
n11:predkladatel
n5:idSjednocenehoVysledku
675406
n5:idVysledku
RIV/00216208:11320/01:00105681
n5:jazykVysledku
n8:eng
n5:klicovaSlova
Characterization;films;deposited;Al2O3;substrate;means;electron;spectroscopy
n5:klicoveSlovo
n13:electron n13:means n13:films n13:Characterization n13:Al2O3 n13:spectroscopy n13:substrate n13:deposited
n5:kodStatuVydavatele
NL - Nizozemsko
n5:kontrolniKodProRIV
[78B92F18759D]
n5:nazevZdroje
Vacuum
n5:obor
n16:BM
n5:pocetDomacichTvurcuVysledku
2
n5:pocetTvurcuVysledku
2
n5:pocetUcastnikuAkce
0
n5:pocetZahranicnichUcastnikuAkce
0
n5:projekt
n6:VS97116 n6:GA202%2F99%2F1714
n5:rokUplatneniVysledku
n10:2001
n5:svazekPeriodika
63
n5:tvurceVysledku
Lykhach, Yaroslava Nehasil, Václav
n5:zamer
n18:MSM%20113200002
s:issn
0042-207X
s:numberOfPages
7
n3:organizacniJednotka
11320