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Statements

Subject Item
n2:RIV%2F00177016%3A_____%2F05%3A%230000329%21RIV11-GA0-00177016
rdf:type
skos:Concept n13:Vysledek
dcterms:description
Spectroscopic ellipsometry (SE) is used to study a sinusoidal-relief grating fabricated on a surface of transparent polymer. An optically thick polymer layer is situated on a glass substrate and its refraction index is optically matched to the index of the glass. The rigorous coupled-wave analysis, implemented as the airy-like internal reflection series, is applied to calculate the optical response of the relief grating. The entire optical response of the sample is determined by employing incoherent backreflections at the interface between the polymer and the glass. The parameters describing the dimensions and the real shape of the sine-like relief, as well as the quality of the optical matching between the polymer and the glass, are determined using SE together with atomic force microscopy as a complementary technique. Spectroscopic ellipsometry (SE) is used to study a sinusoidal-relief grating fabricated on a surface of transparent polymer. An optically thick polymer layer is situated on a glass substrate and its refraction index is optically matched to the index of the glass. The rigorous coupled-wave analysis, implemented as the airy-like internal reflection series, is applied to calculate the optical response of the relief grating. The entire optical response of the sample is determined by employing incoherent backreflections at the interface between the polymer and the glass. The parameters describing the dimensions and the real shape of the sine-like relief, as well as the quality of the optical matching between the polymer and the glass, are determined using SE together with atomic force microscopy as a complementary technique.
dcterms:title
Spectroscopic ellipsometry on sinusoidal surface-relief gratings Spectroscopic ellipsometry on sinusoidal surface-relief gratings
skos:prefLabel
Spectroscopic ellipsometry on sinusoidal surface-relief gratings Spectroscopic ellipsometry on sinusoidal surface-relief gratings
skos:notation
RIV/00177016:_____/05:#0000329!RIV11-GA0-00177016
n3:aktivita
n5:P n5:Z
n3:aktivity
P(GA202/03/0776), Z(MSM0021620834)
n3:cisloPeriodika
01
n3:dodaniDat
n9:2011
n3:domaciTvurceVysledku
n7:2260387
n3:druhVysledku
n17:J
n3:duvernostUdaju
n10:S
n3:entitaPredkladatele
n15:predkladatel
n3:idSjednocenehoVysledku
543908
n3:idVysledku
RIV/00177016:_____/05:#0000329
n3:jazykVysledku
n14:eng
n3:klicovaSlova
ellipsometry
n3:klicoveSlovo
n16:ellipsometry
n3:kodStatuVydavatele
NL - Nizozemsko
n3:kontrolniKodProRIV
[916764B6C710]
n3:nazevZdroje
Applied Surface Science
n3:obor
n18:BM
n3:pocetDomacichTvurcuVysledku
1
n3:pocetTvurcuVysledku
7
n3:projekt
n11:GA202%2F03%2F0776
n3:rokUplatneniVysledku
n9:2005
n3:svazekPeriodika
244
n3:tvurceVysledku
Yamaguchi, T. Franta, D. Mistřík, J. Ohlídal, I. Višnovský, S. Klapetek, Petr Antoš, R.
n3:zamer
n8:MSM0021620834
s:issn
0169-4332
s:numberOfPages
4