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Namespace Prefixes
| Prefix | IRI |
|---|
| n4 | http://linked.opendata.cz/ontology/domain/vavai/riv/ |
| skos | http://www.w3.org/2004/02/skos/core# |
| rdf | http://www.w3.org/1999/02/22-rdf-syntax-ns# |
| n2 | http://linked.opendata.cz/ontology/domain/vavai/riv/klicoveSlovo/ |
| xsdh | http://www.w3.org/2001/XMLSchema# |
Statements
- Subject Item
- n2:Deposition%20Process%20Based%20on%20Organosilicon%20Precursors%20in%20Dielectric%20Barrier%20Discharges%20at%20Atmospheric%20Pressure
- rdf:type
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skos:Concept
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n4:KlicoveSlovo
- skos:prefLabel
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Deposition Process Based on Organosilicon Precursors in Dielectric Barrier Discharges at Atmospheric Pressure - A Comparison
- skos:notation
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Deposition Process Based on Organosilicon Precursors in Dielectric Barrier Discharges at Atmospheric Pressure