About: Adhesion of Rhodococcus sp. S3E2 and Rhodococcus sp. S3E3 to plasma prepared Teflon-like and organosilicon surfaces     Goto   Sponge   NotDistinct   Permalink

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Description
  • The bacterial strains of Rhodococcus sp. S3E2 and Rhodococcus sp. S3E3 were selected for adhesion study on Teflon-like or organosilicon thin films deposited on paper substrate in atmospheric pressure surface barrier discharge. As a carrier gas the nitrogen with small admixture of octafluorocyclobutane or hexamethylenedisiloxane was used. The influence of octafluorocyclobutane and hexamethylenedisiloxane flowrate ratio on later cell adhesion was studied. The cell attachment was evaluated by means of the luminometric measurement of the ATP extracted from adhered cells. The surface properties of deposited layers were investigated by means contact angle measurement and chemical properties of deposited films were studied by means of FTIR spectroscopy. Optical emission spectroscopy was used for investigation of plasma parameters of used plasma.
  • The bacterial strains of Rhodococcus sp. S3E2 and Rhodococcus sp. S3E3 were selected for adhesion study on Teflon-like or organosilicon thin films deposited on paper substrate in atmospheric pressure surface barrier discharge. As a carrier gas the nitrogen with small admixture of octafluorocyclobutane or hexamethylenedisiloxane was used. The influence of octafluorocyclobutane and hexamethylenedisiloxane flowrate ratio on later cell adhesion was studied. The cell attachment was evaluated by means of the luminometric measurement of the ATP extracted from adhered cells. The surface properties of deposited layers were investigated by means contact angle measurement and chemical properties of deposited films were studied by means of FTIR spectroscopy. Optical emission spectroscopy was used for investigation of plasma parameters of used plasma. (en)
Title
  • Adhesion of Rhodococcus sp. S3E2 and Rhodococcus sp. S3E3 to plasma prepared Teflon-like and organosilicon surfaces
  • Adhesion of Rhodococcus sp. S3E2 and Rhodococcus sp. S3E3 to plasma prepared Teflon-like and organosilicon surfaces (en)
skos:prefLabel
  • Adhesion of Rhodococcus sp. S3E2 and Rhodococcus sp. S3E3 to plasma prepared Teflon-like and organosilicon surfaces
  • Adhesion of Rhodococcus sp. S3E2 and Rhodococcus sp. S3E3 to plasma prepared Teflon-like and organosilicon surfaces (en)
skos:notation
  • RIV/70883521:28610/09:63508003!RIV10-MSM-28610___
http://linked.open...avai/riv/aktivita
http://linked.open...avai/riv/aktivity
  • P(GA202/05/0777), Z(MSM0021622411), Z(MSM7088352101)
http://linked.open...iv/cisloPeriodika
  • 6
http://linked.open...vai/riv/dodaniDat
http://linked.open...aciTvurceVysledku
http://linked.open.../riv/druhVysledku
http://linked.open...iv/duvernostUdaju
http://linked.open...titaPredkladatele
http://linked.open...dnocenehoVysledku
  • 354922
http://linked.open...ai/riv/idVysledku
  • RIV/70883521:28610/09:63508003
http://linked.open...riv/jazykVysledku
http://linked.open.../riv/klicovaSlova
  • Rhodococcus; Plasma Deposition; Cell adhesion; Barrier discharge; Thin films (en)
http://linked.open.../riv/klicoveSlovo
http://linked.open...odStatuVydavatele
  • CH - Švýcarská konfederace
http://linked.open...ontrolniKodProRIV
  • [56D58E66356C]
http://linked.open...i/riv/nazevZdroje
  • Journal of Materials Processing Technology
http://linked.open...in/vavai/riv/obor
http://linked.open...ichTvurcuVysledku
http://linked.open...cetTvurcuVysledku
http://linked.open...vavai/riv/projekt
http://linked.open...UplatneniVysledku
http://linked.open...v/svazekPeriodika
  • 209
http://linked.open...iv/tvurceVysledku
  • Koutný, Marek
  • Lehocký, Marián
  • Čech, Jan
  • Sťahel, Pavel
  • Mráček, Aleš
  • Institoris, Jakub
http://linked.open...n/vavai/riv/zamer
issn
  • 0924-0136
number of pages
http://localhost/t...ganizacniJednotka
  • 28610
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