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Description
| - V naší předešlé práci byla popsána nová fotochemická metoda pro odstranění hydrofilních defektů z povrchu pyrolitického SiO2 [1]. Metoda je založena na specifické reakci silanolových a siloxynolových skupin (hlavní defekty) prostřednictvím fotochemicky aktivované kondenzace s aromatickým aldehydem. Tato metoda je komerčně užívána v photolitografpických operacích v planárních technologii [2]. V tomto článku je popisován teoretických základ procesu s třemi reaktanty: benzaldehyd, benzilchlorid a benzoylchlorid. (cs)
- In our previous paper we described a new photochemical method of hydrophilic defects removal from the surface of pyrolitic SiO2 (1). The method is based on the specific reaction of silanol and siloxane groups (the main defects) through photochemically activated condensation utilized in photolithografic operation in planar technology (2). In this paper there is described theoretical basement of the process with three reactives: benzaldehyde, benzilchloride and benzoylchloride as well.
- In our previous paper we described a new photochemical method of hydrophilic defects removal from the surface of pyrolitic SiO2 (1). The method is based on the specific reaction of silanol and siloxane groups (the main defects) through photochemically activated condensation utilized in photolithografic operation in planar technology (2). In this paper there is described theoretical basement of the process with three reactives: benzaldehyde, benzilchloride and benzoylchloride as well. (en)
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Title
| - Transformation of Aromatic Compounds on Pyrolytic Si/SiO2 Surfaces I. Theoretical Aspect of Application
- Proměny aromatických sloučenin na pyrolytických Si/SiO2 površích. I. Teoretické aspekty a aplikace. (cs)
- Transformation of Aromatic Compounds on Pyrolytic Si/SiO2 Surfaces I. Theoretical Aspect of Application (en)
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skos:prefLabel
| - Transformation of Aromatic Compounds on Pyrolytic Si/SiO2 Surfaces I. Theoretical Aspect of Application
- Proměny aromatických sloučenin na pyrolytických Si/SiO2 površích. I. Teoretické aspekty a aplikace. (cs)
- Transformation of Aromatic Compounds on Pyrolytic Si/SiO2 Surfaces I. Theoretical Aspect of Application (en)
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skos:notation
| - RIV/70883521:28110/06:63504764!RIV07-MSM-28110___
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http://linked.open.../vavai/riv/strany
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http://linked.open...avai/riv/aktivita
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http://linked.open...avai/riv/aktivity
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http://linked.open...vai/riv/dodaniDat
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http://linked.open...aciTvurceVysledku
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http://linked.open.../riv/druhVysledku
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http://linked.open...iv/duvernostUdaju
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http://linked.open...titaPredkladatele
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http://linked.open...dnocenehoVysledku
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http://linked.open...ai/riv/idVysledku
| - RIV/70883521:28110/06:63504764
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http://linked.open...riv/jazykVysledku
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http://linked.open.../riv/klicovaSlova
| - Defects of SiO2; surface; silanol and siloxane groups; photochemical reactions on SiO2; benzaldehyde; benzilchloride; benzoylchloride (en)
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http://linked.open.../riv/klicoveSlovo
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http://linked.open...ontrolniKodProRIV
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http://linked.open...i/riv/mistoVydani
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http://linked.open...i/riv/nazevZdroje
| - SILICON 2006 The Tenth Scientific and Business Conference
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http://linked.open...in/vavai/riv/obor
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http://linked.open...ichTvurcuVysledku
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http://linked.open...cetTvurcuVysledku
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http://linked.open...UplatneniVysledku
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http://linked.open...iv/tvurceVysledku
| - Lapčík, Lubomír
- Lapčíková, Barbora
- Minařík, Antonín
- Pelikán, Peter
- Macháčková, Alena
- Vojtěchovský, Karel
- Čeppan, Michal
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http://linked.open...n/vavai/riv/zamer
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number of pages
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http://purl.org/ne...btex#hasPublisher
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https://schema.org/isbn
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http://localhost/t...ganizacniJednotka
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is http://linked.open...avai/riv/vysledek
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