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Description
| - We used a free-standing grating spectrometer with 0.01 nm spectral resolution to compare spectral characteristics of two table-top sources of extreme ultraviolet (XUV) radiation - laser-produced plasma from a gas-puff target and plasma produced by pinching capillary discharge. The spectral line at 2.88 nm emitted by nitrogen plasma was of particular interest because it can be used for quasi-monochromatic imaging in the XUV water window. The pulse energy produced by the discharge plasma source at 2.88 nm was found to be about one order higher compared to the laser-plasma source (0.16 mJ srad-1 and 0.02 mJ srad-1, respectively). On the other hand, the radiation from laser-plasma is more spectrally pure as the spectrum of discharge plasma contains additional weak emission lines of carbon ions generated from the insulating oil.
- We used a free-standing grating spectrometer with 0.01 nm spectral resolution to compare spectral characteristics of two table-top sources of extreme ultraviolet (XUV) radiation - laser-produced plasma from a gas-puff target and plasma produced by pinching capillary discharge. The spectral line at 2.88 nm emitted by nitrogen plasma was of particular interest because it can be used for quasi-monochromatic imaging in the XUV water window. The pulse energy produced by the discharge plasma source at 2.88 nm was found to be about one order higher compared to the laser-plasma source (0.16 mJ srad-1 and 0.02 mJ srad-1, respectively). On the other hand, the radiation from laser-plasma is more spectrally pure as the spectrum of discharge plasma contains additional weak emission lines of carbon ions generated from the insulating oil. (en)
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Title
| - Spectral Characterization of XUV Sources based on Plasmas Induced by Laser and Capillary Discharge
- Spectral Characterization of XUV Sources based on Plasmas Induced by Laser and Capillary Discharge (en)
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skos:prefLabel
| - Spectral Characterization of XUV Sources based on Plasmas Induced by Laser and Capillary Discharge
- Spectral Characterization of XUV Sources based on Plasmas Induced by Laser and Capillary Discharge (en)
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skos:notation
| - RIV/68407700:21340/12:00201792!RIV13-GA0-21340___
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http://linked.open...avai/predkladatel
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http://linked.open...avai/riv/aktivita
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http://linked.open...avai/riv/aktivity
| - P(EE.2.3.20.0092), P(GAP102/12/2043)
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http://linked.open...vai/riv/dodaniDat
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http://linked.open...aciTvurceVysledku
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http://linked.open.../riv/druhVysledku
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http://linked.open...iv/duvernostUdaju
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http://linked.open...titaPredkladatele
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http://linked.open...dnocenehoVysledku
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http://linked.open...ai/riv/idVysledku
| - RIV/68407700:21340/12:00201792
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http://linked.open...riv/jazykVysledku
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http://linked.open.../riv/klicovaSlova
| - spectrometer; extreme ultraviolet (XUV) radiation; plasma; gas-puff target; pinching capillary; spectrum (en)
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http://linked.open.../riv/klicoveSlovo
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http://linked.open...ontrolniKodProRIV
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http://linked.open...in/vavai/riv/obor
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http://linked.open...ichTvurcuVysledku
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http://linked.open...cetTvurcuVysledku
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http://linked.open...vavai/riv/projekt
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http://linked.open...UplatneniVysledku
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http://linked.open...iv/tvurceVysledku
| - Kolář, Petr
- Vrbová, Miroslava
- Pánek, Dalibor
- Jančárek, Alexandr
- Nevrkla, Michal
- Vrba, P.
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http://localhost/t...ganizacniJednotka
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