About: Plasma deposition and photoelectrochemical properties of nanoscaled titanium (IV) oxide thin films

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rdf:type	skos:Concept http://linked.opendata.cz/ontology/domain/vavai/Vysledek
Description	Various techniques were used for the preparation of titanium (IV) oxide nanoscaled thin films. The deposition of the layers was carried out in the environment of chemically active plasma due to the utilization of plasma assisted devices including PVD hollow cathode plasma jet sputtering system, PVD magnetron sputtering and PECVD technique using surfatron produced plasma discharge as a jet type. The sol-gel process realized in the reverse micelle environment was chosen as a purely chemical procedure. All layers were tested then for their photo-induced electrochemical properties based on evaluation of polarization curves and corresponding photocurrents. Various techniques were used for the preparation of titanium (IV) oxide nanoscaled thin films. The deposition of the layers was carried out in the environment of chemically active plasma due to the utilization of plasma assisted devices including PVD hollow cathode plasma jet sputtering system, PVD magnetron sputtering and PECVD technique using surfatron produced plasma discharge as a jet type. The sol-gel process realized in the reverse micelle environment was chosen as a purely chemical procedure. All layers were tested then for their photo-induced electrochemical properties based on evaluation of polarization curves and corresponding photocurrents. (en) Vrstvy TiO2 byly připravovány několika různými postupy. Jednalo se o plazmachemické metody depozice (magnetronové naprašování, surfatron, DC pulzní výboj v duté katodě). Zcela odlišnou techniku přípravy vrstev představovala chemická metoda sol-gel, probíhající v prostředí tzv. inverzních micel. Připravené vrstvy byly srovnávány z hlediska jejich fotoindukovatelných vlastností pomocí elektrochemických experimentů. (cs)
Title	Plasma deposition and photoelectrochemical properties of nanoscaled titanium (IV) oxide thin films Plasma deposition and photoelectrochemical properties of nanoscaled titanium (IV) oxide thin films (en) Plazmová depozice a fotoelektrochemické vlastnosti TiO2 (cs)
skos:prefLabel	Plasma deposition and photoelectrochemical properties of nanoscaled titanium (IV) oxide thin films Plasma deposition and photoelectrochemical properties of nanoscaled titanium (IV) oxide thin films (en) Plazmová depozice a fotoelektrochemické vlastnosti TiO2 (cs)
skos:notation	RIV/68407700:21340/08:04152942!RIV09-MSM-21340___
http://linked.open...avai/riv/aktivita	Z
http://linked.open...avai/riv/aktivity	Z(MSM6840770021)
http://linked.open...vai/riv/dodaniDat	2009
http://linked.open...aciTvurceVysledku	Kment, Štěpán
http://linked.open.../riv/druhVysledku	D - Článek ve sborníku
http://linked.open...iv/duvernostUdaju	S - Úplné a pravdivé údaje nepodléhající ochraně podle zvláštních právních předpisů
http://linked.open...titaPredkladatele	České vysoké učení technické v Praze / Fakulta jaderná a fyzikálně inženýrská
http://linked.open...dnocenehoVysledku	386778
http://linked.open...ai/riv/idVysledku	RIV/68407700:21340/08:04152942
http://linked.open...riv/jazykVysledku	eng - angličtina
http://linked.open.../riv/klicovaSlova	TiO2; Thin films; Magnetron sputtering; Surfatron; DC hollow cathode; Sol-gePhotocurrents; IPCE (en)
http://linked.open.../riv/klicoveSlovo	Thin films Magnetron sputtering TiO2 IPCE DC hollow cathode Sol-gePhotocurrents Surfatron
http://linked.open...ontrolniKodProRIV	[E111885A53A0]
http://linked.open...v/mistoKonaniAkce	Hnanice
http://linked.open...i/riv/mistoVydani	Technická 5, 16628 Praha
http://linked.open...i/riv/nazevZdroje	Recent advances in photochemistry, electrochemistry and photocatalysts - Proceedings of workshop
http://linked.open...in/vavai/riv/obor	BM
http://linked.open...ichTvurcuVysledku	1 (xsd:int)
http://linked.open...cetTvurcuVysledku	6 (xsd:int)
http://linked.open...UplatneniVysledku	2008
http://linked.open...iv/tvurceVysledku	Kment, Štěpán Krýsa, J. Straňák, V. Čada, M. Klusoň, P. Virostko, P.
http://linked.open...vavai/riv/typAkce	EUR - Evropská
http://linked.open.../riv/zahajeniAkce	2007-12-04 (xsd:date)
http://linked.open...n/vavai/riv/zamer	Characterization of materials
number of pages	3 (xsd:int)
http://purl.org/ne...btex#hasPublisher	Vydavatelství VŠCHT Praha
https://schema.org/isbn	978-80-7080-680-7
http://localhost/t...ganizacniJednotka	21340
is http://linked.open...avai/riv/vysledek of	Plasma deposition and photoelectrochemical properties of nanoscaled titanium (IV) oxide thin films Plasma deposition and photoelectrochemical properties of nanoscaled titanium (IV) oxide thin films Plasma deposition and photoelectrochemical properties of nanoscaled titanium (IV) oxide thin films Plasma deposition and photoelectrochemical properties of nanoscaled titanium (IV) oxide thin films

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