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  • A new method of fabrication of nanocrystalline silicon-based light-emitting-devices is introduced. Si nanocrystals are derived from combustion or pyrolysis of silane and etched subsequently in a two-phase solution of HF. The p–i–n diodes have an active layer (20–60 nm) of Si nanocrystals sandwiched between thin isolating layers of SiO2 or a-Si : H and a top-layer of p+ doped silicon, the substrate being of n+ Si. For both types of structures, electroluminescence is observed under forward bias exceeding 5 V and the spectrum consists of a broad band (due to a large size distribution of Si nanocrystals) centred around 650 nm and giving a yellowish appearance when observed by naked-eye. The integrated electroluminescence intensity growths with the square of applied bias.
  • A new method of fabrication of nanocrystalline silicon-based light-emitting-devices is introduced. Si nanocrystals are derived from combustion or pyrolysis of silane and etched subsequently in a two-phase solution of HF. The p–i–n diodes have an active layer (20–60 nm) of Si nanocrystals sandwiched between thin isolating layers of SiO2 or a-Si : H and a top-layer of p+ doped silicon, the substrate being of n+ Si. For both types of structures, electroluminescence is observed under forward bias exceeding 5 V and the spectrum consists of a broad band (due to a large size distribution of Si nanocrystals) centred around 650 nm and giving a yellowish appearance when observed by naked-eye. The integrated electroluminescence intensity growths with the square of applied bias. (en)
Title
  • Electroluminiscence of Silicon Nanocrystals in p-i-n Diodes Structure
  • Není k dispozici (cs)
  • Electroluminiscence of Silicon Nanocrystals in p-i-n Diodes Structure (en)
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  • Electroluminiscence of Silicon Nanocrystals in p-i-n Diodes Structure
  • Není k dispozici (cs)
  • Electroluminiscence of Silicon Nanocrystals in p-i-n Diodes Structure (en)
skos:notation
  • RIV/68407700:21340/06:04126689!RIV07-AV0-21340___
http://linked.open.../vavai/riv/strany
  • 775;777
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  • P(KAN400670651), S
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  • 473784
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  • RIV/68407700:21340/06:04126689
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  • electroluminescence; pin diode; quantum dot; quantum nanostructure; silicon nanocrystal (en)
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  • CH - Švýcarská konfederace
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  • [B6F2D76D4AF7]
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  • Thin Solid Films
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  • 515
http://linked.open...iv/tvurceVysledku
  • Valenta, J.
  • Stuchlík, J.
  • Fojtík, Anton
  • Kočka, J.
  • Pelant, I.
  • Stuchlíková, T. H.
issn
  • 0040-6090
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  • 21340
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