About: 2D sliding bench for lithographic exposure

Facets (new session)
Description
Metadata
Settings
- owl:sameAs
- Inference Rule:

About: 2D sliding bench for lithographic exposure Goto Sponge NotDistinct Permalink

An Entity of Type : http://linked.opendata.cz/ontology/domain/vavai/Vysledek, within Data Space : linked.opendata.cz associated with source document(s)

Attributes	Values
rdf:type	skos:Concept http://linked.opendata.cz/ontology/domain/vavai/Vysledek
Description	The paper describes construction and applicability of the two dimensional sliding bench. It can be used for precise adjustment in the plane during the lithographical exposure of the substrate. It is applicable for exposure on the gel mask or direct exposure to the final substrate. It was developed mainly for preparing of the simple microelectromechanical structures for the gas sensors (SAW structures, application of active substances for conductivity sensors, micromechanical structures adjustment and trimming). Light exposure is provided via the lens and enlarged pattern for a given wavelength (these optical components are not a part of the bench). The bench allows replication of one structure over a larger area of the mask (substrate) and automated intensity setting and timing. The bench can also be used for direct writing of simple structures into the photo-resist. The paper describes construction and applicability of the two dimensional sliding bench. It can be used for precise adjustment in the plane during the lithographical exposure of the substrate. It is applicable for exposure on the gel mask or direct exposure to the final substrate. It was developed mainly for preparing of the simple microelectromechanical structures for the gas sensors (SAW structures, application of active substances for conductivity sensors, micromechanical structures adjustment and trimming). Light exposure is provided via the lens and enlarged pattern for a given wavelength (these optical components are not a part of the bench). The bench allows replication of one structure over a larger area of the mask (substrate) and automated intensity setting and timing. The bench can also be used for direct writing of simple structures into the photo-resist. (en)
Title	2D sliding bench for lithographic exposure (en) 2D sliding bench for lithographic exposure
skos:prefLabel	2D sliding bench for lithographic exposure (en) 2D sliding bench for lithographic exposure
skos:notation	RIV/68407700:21230/14:00222312!RIV15-MV0-21230___
http://linked.open...avai/riv/aktivita	P
http://linked.open...avai/riv/aktivity	P(VG20102015015)
http://linked.open...vai/riv/dodaniDat	2015
http://linked.open...aciTvurceVysledku	Bouřa, Adam
http://linked.open.../riv/druhVysledku	D - Článek ve sborníku
http://linked.open...iv/duvernostUdaju	S - Úplné a pravdivé údaje nepodléhající ochraně podle zvláštních právních předpisů
http://linked.open...titaPredkladatele	České vysoké učení technické v Praze / Fakulta elektrotechnická
http://linked.open...dnocenehoVysledku	58159
http://linked.open...ai/riv/idVysledku	RIV/68407700:21230/14:00222312
http://linked.open...riv/jazykVysledku	eng - angličtina
http://linked.open.../riv/klicovaSlova	Test bench; Sensor characterization; Distance measurement; Lithography (en)
http://linked.open.../riv/klicoveSlovo	Distance measurement Sensor characterization Test bench Lithography
http://linked.open...ontrolniKodProRIV	[809BACA877C4]
http://linked.open...v/mistoKonaniAkce	Brno
http://linked.open...i/riv/mistoVydani	Brno
http://linked.open...i/riv/nazevZdroje	Electronic Devices and Systems IMAPS CS International Conference 2014
http://linked.open...in/vavai/riv/obor	JA
http://linked.open...ichTvurcuVysledku	1 (xsd:int)
http://linked.open...cetTvurcuVysledku	1 (xsd:int)
http://linked.open...vavai/riv/projekt	Miniature intelligent system for analyzing concentrations of gases and pollutants, particularly toxic
http://linked.open...UplatneniVysledku	2014
http://linked.open...iv/tvurceVysledku	Bouřa, Adam
http://linked.open...vavai/riv/typAkce	EUR - Evropská
http://linked.open.../riv/zahajeniAkce	2014-06-25 (xsd:date)
number of pages	5 (xsd:int)
http://purl.org/ne...btex#hasPublisher	Vysoké učení technické v Brně. Fakulta elektrotechniky a komunikačních technologií
https://schema.org/isbn	978-80-214-4985-5
http://localhost/t...ganizacniJednotka	21230

Faceted Search & Find service v1.16.118 as of Jun 21 2024

Alternative Linked Data Documents: ODE Content Formats:

RDF

ODATA

Microdata

About

OpenLink Virtuoso version 07.20.3240 as of Jun 21 2024, on Linux (x86_64-pc-linux-gnu), Single-Server Edition (126 GB total memory, 112 GB memory in use)
Data on this page belongs to its respective rights holders.
Virtuoso Faceted Browser Copyright © 2009-2024 OpenLink Software