About: TiOx Films Deposited by Plasma Enhanced Chemical Vapour Deposition Method in Atmospheric Dielectric Barrier Discharge Plasma

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Attributes	Values
rdf:type	skos:Concept http://linked.opendata.cz/ontology/domain/vavai/Vysledek
rdfs:seeAlso	http://download.springer.com/static/pdf/372/art%253A10.1007%252Fs11090-012-9401-0.pdf?auth66=1351696285_b7ae346d64f3dc0c16f3f2273f03605b&ext=.pdf
Description	The plasma enhanced chemical vapour deposition method applying atmospheric dielectric barrier discharge (ADBD) plasma was used for TiOx thin films deposition employing titanium (IV) isopropoxide and oxygen as reactants, and argon as a working gas. ADBD was operated in the filamentary mode. The films were deposited on glass. The films0 chemical composition, surface topography, wettability and aging were analysed, particularly the dependence between precursor and reactant concentration in the discharge atmosphere and its impact on TiOx films properties. Titanium in films near the surface area was oxidized, the dominating species being TiO2 and substoichiometric titanium oxides. The films exhibited contamination with carbon, as a result of atmospheric oxygen and carbon dioxide reactions with radicals in films. No relevant difference of the film surface due to oxygen concentration inside the reactor was determined. The films were hydrophilic immediately after deposition, afterwards their wettability diminished, due to chemical reactions of the film surface and chemical groups involved in the atmosphere The plasma enhanced chemical vapour deposition method applying atmospheric dielectric barrier discharge (ADBD) plasma was used for TiOx thin films deposition employing titanium (IV) isopropoxide and oxygen as reactants, and argon as a working gas. ADBD was operated in the filamentary mode. The films were deposited on glass. The films0 chemical composition, surface topography, wettability and aging were analysed, particularly the dependence between precursor and reactant concentration in the discharge atmosphere and its impact on TiOx films properties. Titanium in films near the surface area was oxidized, the dominating species being TiO2 and substoichiometric titanium oxides. The films exhibited contamination with carbon, as a result of atmospheric oxygen and carbon dioxide reactions with radicals in films. No relevant difference of the film surface due to oxygen concentration inside the reactor was determined. The films were hydrophilic immediately after deposition, afterwards their wettability diminished, due to chemical reactions of the film surface and chemical groups involved in the atmosphere (en)
Title	TiOx Films Deposited by Plasma Enhanced Chemical Vapour Deposition Method in Atmospheric Dielectric Barrier Discharge Plasma TiOx Films Deposited by Plasma Enhanced Chemical Vapour Deposition Method in Atmospheric Dielectric Barrier Discharge Plasma (en)
skos:prefLabel	TiOx Films Deposited by Plasma Enhanced Chemical Vapour Deposition Method in Atmospheric Dielectric Barrier Discharge Plasma TiOx Films Deposited by Plasma Enhanced Chemical Vapour Deposition Method in Atmospheric Dielectric Barrier Discharge Plasma (en)
skos:notation	RIV/68407700:21230/12:00196699!RIV13-MSM-21230___
http://linked.open...avai/predkladatel	Fakulta elektrotechnická
http://linked.open...avai/riv/aktivita	S
http://linked.open...avai/riv/aktivity	S
http://linked.open...iv/cisloPeriodika	146
http://linked.open...vai/riv/dodaniDat	2013
http://linked.open...aciTvurceVysledku	Píchal, Jan Klenko, Yuliya
http://linked.open.../riv/druhVysledku	J - Článek v odborném periodiku
http://linked.open...iv/duvernostUdaju	S - Úplné a pravdivé údaje nepodléhající ochraně podle zvláštních právních předpisů
http://linked.open...titaPredkladatele	České vysoké učení technické v Praze / Fakulta elektrotechnická
http://linked.open...dnocenehoVysledku	174503
http://linked.open...ai/riv/idVysledku	RIV/68407700:21230/12:00196699
http://linked.open...riv/jazykVysledku	eng - angličtina
http://linked.open.../riv/klicovaSlova	Atmospheric dielectric barrier discharge; Chemical composition; Plasma enhanced chemical vapour deposition; Thin film; Titanium isopropoxide (TTIP); TiOx (en)
http://linked.open.../riv/klicoveSlovo	TiOx Titanium isopropoxide (TTIP) Chemical composition Plasma enhanced chemical vapour deposition Atmospheric dielectric barrier discharge Thin film
http://linked.open...odStatuVydavatele	US - Spojené státy americké
http://linked.open...ontrolniKodProRIV	[1149E7348738]
http://linked.open...i/riv/nazevZdroje	PLASMA CHEMISTRY AND PLASMA PROCESSING
http://linked.open...in/vavai/riv/obor	BL
http://linked.open...ichTvurcuVysledku	2 (xsd:int)
http://linked.open...cetTvurcuVysledku	2 (xsd:int)
http://linked.open...UplatneniVysledku	2012
http://linked.open...v/svazekPeriodika	32
http://linked.open...iv/tvurceVysledku	Píchal, Jan Klenko, Yuliya
http://linked.open...ain/vavai/riv/wos	000310321800007
issn	0272-4324
number of pages	11 (xsd:int)
http://bibframe.org/vocab/doi	10.1007/s11090-012-9401-0
http://localhost/t...ganizacniJednotka	21230
is http://linked.open...avai/riv/vysledek of	TiOx Films Deposited by Plasma Enhanced Chemical Vapour Deposition Method in Atmospheric Dielectric Barrier Discharge Plasma

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