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  • The effect of peak power in a high power impulse magnetron sputtering (HiPIMS) reactive deposition of TiO2 films has been studied with respect to the deposition rate and coating properties. With increasing peak power not only the ionization of the sputtered material increases but also their energy. In order to correlate the variation in the ion energy distributions with the film properties, the phase composition, density and optical properties of the films grown with different HiPIMS-parameters have been investigated and compared to a film grown using direct current magnetron sputtering (DCMS). All experiments were performed for constant average power and pulse on time (100W and 35 μs, respectively), different peak powers were achieved by varying the frequency of pulsing. Ion energy distributions for Ti and O and its dependence on the process conditions have been studied.
  • The effect of peak power in a high power impulse magnetron sputtering (HiPIMS) reactive deposition of TiO2 films has been studied with respect to the deposition rate and coating properties. With increasing peak power not only the ionization of the sputtered material increases but also their energy. In order to correlate the variation in the ion energy distributions with the film properties, the phase composition, density and optical properties of the films grown with different HiPIMS-parameters have been investigated and compared to a film grown using direct current magnetron sputtering (DCMS). All experiments were performed for constant average power and pulse on time (100W and 35 μs, respectively), different peak powers were achieved by varying the frequency of pulsing. Ion energy distributions for Ti and O and its dependence on the process conditions have been studied. (en)
Title
  • Effect of peak power in reactive high power impulse magnetron sputtering of titanium dioxide
  • Effect of peak power in reactive high power impulse magnetron sputtering of titanium dioxide (en)
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  • Effect of peak power in reactive high power impulse magnetron sputtering of titanium dioxide
  • Effect of peak power in reactive high power impulse magnetron sputtering of titanium dioxide (en)
skos:notation
  • RIV/68407700:21230/11:00184416!RIV12-MSM-21230___
http://linked.open...avai/predkladatel
http://linked.open...avai/riv/aktivita
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  • I
http://linked.open...iv/cisloPeriodika
  • 20
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  • 196392
http://linked.open...ai/riv/idVysledku
  • RIV/68407700:21230/11:00184416
http://linked.open...riv/jazykVysledku
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  • HiPIMS; Titanium dioxide; Rutile; Anatase; Reactive sputtering; TiO2 (en)
http://linked.open.../riv/klicoveSlovo
http://linked.open...odStatuVydavatele
  • NL - Nizozemsko
http://linked.open...ontrolniKodProRIV
  • [0D43FA1C3842]
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  • Surface & Coatings Technology
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  • 205
http://linked.open...iv/tvurceVysledku
  • Aiempanakit, M.
  • Aijaz, A.
  • Helmersson, U.
  • Jensen, J.
  • Kubart, Tomáš
  • Larsson, P.
  • Magnusson, R.
http://linked.open...ain/vavai/riv/wos
  • 000292361400013
issn
  • 0257-8972
number of pages
http://bibframe.org/vocab/doi
  • 10.1016/j.surfcoat.2011.04.071
http://localhost/t...ganizacniJednotka
  • 21230
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