About: Hysteresis and process stability in reactive high power impulse magnetron sputtering of metal oxides

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rdf:type	skos:Concept http://linked.opendata.cz/ontology/domain/vavai/Vysledek
Description	In the further development of reactive sputter deposition, strategies which allow for stabilization of the transition zone between the metallic and compound modes, elimination of the process hysteresis, and increase of the deposition rate, are of particular interest. In this study, the hysteresis behavior and the characteristics of the transition zone during reactive high power impulse magnetron sputtering (HiPIMS) of Al and Ce targets in an Ar-O2 atmosphere as a function of the pulsing frequency and the pumping speed are investigated. Comparison with reactive direct current magnetron sputtering (DCMS) reveals that HiPIMS allows for elimination/suppression of the hysteresis and a smoother transition from the metallic to the compound sputtering mode. For the experimental conditions employed in the present study, optimum behavior with respect to the hysteresis width is obtained at frequency values between 2 and 4 kHz. In the further development of reactive sputter deposition, strategies which allow for stabilization of the transition zone between the metallic and compound modes, elimination of the process hysteresis, and increase of the deposition rate, are of particular interest. In this study, the hysteresis behavior and the characteristics of the transition zone during reactive high power impulse magnetron sputtering (HiPIMS) of Al and Ce targets in an Ar-O2 atmosphere as a function of the pulsing frequency and the pumping speed are investigated. Comparison with reactive direct current magnetron sputtering (DCMS) reveals that HiPIMS allows for elimination/suppression of the hysteresis and a smoother transition from the metallic to the compound sputtering mode. For the experimental conditions employed in the present study, optimum behavior with respect to the hysteresis width is obtained at frequency values between 2 and 4 kHz. (en)
Title	Hysteresis and process stability in reactive high power impulse magnetron sputtering of metal oxides Hysteresis and process stability in reactive high power impulse magnetron sputtering of metal oxides (en)
skos:prefLabel	Hysteresis and process stability in reactive high power impulse magnetron sputtering of metal oxides Hysteresis and process stability in reactive high power impulse magnetron sputtering of metal oxides (en)
skos:notation	RIV/68407700:21230/11:00184412!RIV12-MSM-21230___
http://linked.open...avai/predkladatel	Fakulta elektrotechnická
http://linked.open...avai/riv/aktivita	I
http://linked.open...avai/riv/aktivity	I
http://linked.open...iv/cisloPeriodika	22
http://linked.open...vai/riv/dodaniDat	2012
http://linked.open...aciTvurceVysledku	Kubart, Tomáš
http://linked.open.../riv/druhVysledku	J - Článek v odborném periodiku
http://linked.open...iv/duvernostUdaju	S - Úplné a pravdivé údaje nepodléhající ochraně podle zvláštních právních předpisů
http://linked.open...titaPredkladatele	České vysoké učení technické v Praze / Fakulta elektrotechnická
http://linked.open...dnocenehoVysledku	203245
http://linked.open...ai/riv/idVysledku	RIV/68407700:21230/11:00184412
http://linked.open...riv/jazykVysledku	eng - angličtina
http://linked.open.../riv/klicovaSlova	Reactive sputtering; High power impulse magnetron sputtering; Aluminum oxide; Cerium oxide; Hysteresis; Process stability (en)
http://linked.open.../riv/klicoveSlovo	Cerium oxide Hysteresis Reactive sputtering Aluminum oxide High power impulse magnetron sputtering Process stability
http://linked.open...odStatuVydavatele	CH - Švýcarská konfederace
http://linked.open...ontrolniKodProRIV	[88DFEAC81021]
http://linked.open...i/riv/nazevZdroje	Thin Solid Films
http://linked.open...in/vavai/riv/obor	JI
http://linked.open...ichTvurcuVysledku	1 (xsd:int)
http://linked.open...cetTvurcuVysledku	6 (xsd:int)
http://linked.open...UplatneniVysledku	2011
http://linked.open...v/svazekPeriodika	519
http://linked.open...iv/tvurceVysledku	Aiempanakit, M. Helmersson, U. Jensen, J. Kubart, Tomáš Larsson, P. Sarakinos, K.
http://linked.open...ain/vavai/riv/wos	000295057000027
issn	0040-6090
number of pages	6 (xsd:int)
http://bibframe.org/vocab/doi	10.1016/j.tsf.2011.06.021
http://localhost/t...ganizacniJednotka	21230
is http://linked.open...avai/riv/vysledek of	Hysteresis and process stability in reactive high power impulse magnetron sputtering of metal oxides Hysteresis and process stability in reactive high power impulse magnetron sputtering of metal oxides

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