About: The Thin Film Capacitors with AlN Dielectric     Goto   Sponge   NotDistinct   Permalink

An Entity of Type : http://linked.opendata.cz/ontology/domain/vavai/Vysledek, within Data Space : linked.opendata.cz associated with source document(s)

AttributesValues
rdf:type
Description
  • The work is focused on thin film technologies especially on sputtering of dielectric thin film layers. The AlN dielectric layer was prepared by reactive high frequency sputtering from aluminum target in nitrogen atmosphere. Dielectric layers were deposited at different conditions of sputtering. The power plasma generator and time of sputtering were changed in useful range. Part of work is concerned to investigation of dependence of electrical capacity of thick film capacitors on thickness of dielectric layer. Thickness and thus electrical capacity are depending on distance between target and substrate. Thickness of dielectric layer was measured by using of confocal microscope.
  • The work is focused on thin film technologies especially on sputtering of dielectric thin film layers. The AlN dielectric layer was prepared by reactive high frequency sputtering from aluminum target in nitrogen atmosphere. Dielectric layers were deposited at different conditions of sputtering. The power plasma generator and time of sputtering were changed in useful range. Part of work is concerned to investigation of dependence of electrical capacity of thick film capacitors on thickness of dielectric layer. Thickness and thus electrical capacity are depending on distance between target and substrate. Thickness of dielectric layer was measured by using of confocal microscope. (en)
Title
  • The Thin Film Capacitors with AlN Dielectric
  • The Thin Film Capacitors with AlN Dielectric (en)
skos:prefLabel
  • The Thin Film Capacitors with AlN Dielectric
  • The Thin Film Capacitors with AlN Dielectric (en)
skos:notation
  • RIV/68407700:21230/10:00171381!RIV11-MSM-21230___
http://linked.open...avai/riv/aktivita
http://linked.open...avai/riv/aktivity
  • Z(MSM6840770021)
http://linked.open...vai/riv/dodaniDat
http://linked.open...aciTvurceVysledku
http://linked.open.../riv/druhVysledku
http://linked.open...iv/duvernostUdaju
http://linked.open...titaPredkladatele
http://linked.open...dnocenehoVysledku
  • 292794
http://linked.open...ai/riv/idVysledku
  • RIV/68407700:21230/10:00171381
http://linked.open...riv/jazykVysledku
http://linked.open.../riv/klicovaSlova
  • reactive sputtering; thin film dielectric layer (en)
http://linked.open.../riv/klicoveSlovo
http://linked.open...ontrolniKodProRIV
  • [82FC82D3BBAC]
http://linked.open...v/mistoKonaniAkce
  • Olomouc
http://linked.open...i/riv/mistoVydani
  • Ostrava
http://linked.open...i/riv/nazevZdroje
  • NANOCON 2010
http://linked.open...in/vavai/riv/obor
http://linked.open...ichTvurcuVysledku
http://linked.open...cetTvurcuVysledku
http://linked.open...UplatneniVysledku
http://linked.open...iv/tvurceVysledku
  • Beshajová Pelikánová, Ivana
  • Cinert, J.
http://linked.open...vavai/riv/typAkce
http://linked.open.../riv/zahajeniAkce
http://linked.open...n/vavai/riv/zamer
number of pages
http://purl.org/ne...btex#hasPublisher
  • Tanger s.r.o.
https://schema.org/isbn
  • 978-80-87294-18-5
http://localhost/t...ganizacniJednotka
  • 21230
is http://linked.open...avai/riv/vysledek of
Faceted Search & Find service v1.16.118 as of Jun 21 2024


Alternative Linked Data Documents: ODE     Content Formats:   [cxml] [csv]     RDF   [text] [turtle] [ld+json] [rdf+json] [rdf+xml]     ODATA   [atom+xml] [odata+json]     Microdata   [microdata+json] [html]    About   
This material is Open Knowledge   W3C Semantic Web Technology [RDF Data] Valid XHTML + RDFa
OpenLink Virtuoso version 07.20.3240 as of Jun 21 2024, on Linux (x86_64-pc-linux-gnu), Single-Server Edition (126 GB total memory, 41 GB memory in use)
Data on this page belongs to its respective rights holders.
Virtuoso Faceted Browser Copyright © 2009-2024 OpenLink Software