About: Modelling of sputtering yield amplification effect in reactive deposition of oxides

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rdf:type	skos:Concept http://linked.opendata.cz/ontology/domain/vavai/Vysledek
Description	Many reactive sputter deposition applications require high deposition rates. The primary limiting parameters in magnetron sputtering are the target power dissipation and sputtering yields of the target elements. In reactive deposition of oxides, the deposition rate is of particular interest due to the low sputtering yield of most commonly used oxides. By doping the sputtering target with heavy elements, it is possible to substantially enhance the sputtering yield and hence the deposition rate. Simulations of the partial sputtering yield values for aluminium from doped targets sputtered in reactive atmosphere have been carried out. Our simulations indicate that the sputtering yield amplification in reactive sputtering may lead to much higher relative deposition rate increase than in a nonreactive case. The highest relative increase may be achieved in the transition region but substantial increase is predicted also in the oxide mode. Many reactive sputter deposition applications require high deposition rates. The primary limiting parameters in magnetron sputtering are the target power dissipation and sputtering yields of the target elements. In reactive deposition of oxides, the deposition rate is of particular interest due to the low sputtering yield of most commonly used oxides. By doping the sputtering target with heavy elements, it is possible to substantially enhance the sputtering yield and hence the deposition rate. Simulations of the partial sputtering yield values for aluminium from doped targets sputtered in reactive atmosphere have been carried out. Our simulations indicate that the sputtering yield amplification in reactive sputtering may lead to much higher relative deposition rate increase than in a nonreactive case. The highest relative increase may be achieved in the transition region but substantial increase is predicted also in the oxide mode. (en)
Title	Modelling of sputtering yield amplification effect in reactive deposition of oxides Modelling of sputtering yield amplification effect in reactive deposition of oxides (en)
skos:prefLabel	Modelling of sputtering yield amplification effect in reactive deposition of oxides Modelling of sputtering yield amplification effect in reactive deposition of oxides (en)
skos:notation	RIV/68407700:21230/10:00168535!RIV11-GA0-21230___
http://linked.open...avai/riv/aktivita	P
http://linked.open...avai/riv/aktivity	P(GAP108/10/0218)
http://linked.open...iv/cisloPeriodika	23
http://linked.open...vai/riv/dodaniDat	2011
http://linked.open...aciTvurceVysledku	Kubart, Tomáš
http://linked.open.../riv/druhVysledku	J - Článek v odborném periodiku
http://linked.open...iv/duvernostUdaju	S - Úplné a pravdivé údaje nepodléhající ochraně podle zvláštních právních předpisů
http://linked.open...titaPredkladatele	České vysoké učení technické v Praze / Fakulta elektrotechnická
http://linked.open...dnocenehoVysledku	271967
http://linked.open...ai/riv/idVysledku	RIV/68407700:21230/10:00168535
http://linked.open...riv/jazykVysledku	eng - angličtina
http://linked.open.../riv/klicovaSlova	Reactive sputtering; Magnetron sputtering; Oxides; Deposition rate; TRIDYN (en)
http://linked.open.../riv/klicoveSlovo	Deposition rate Magnetron sputtering Oxides Reactive sputtering TRIDYN
http://linked.open...odStatuVydavatele	NL - Nizozemsko
http://linked.open...ontrolniKodProRIV	[81C89652A1CB]
http://linked.open...i/riv/nazevZdroje	Surface & Coatings Technology
http://linked.open...in/vavai/riv/obor	BL
http://linked.open...ichTvurcuVysledku	1 (xsd:int)
http://linked.open...cetTvurcuVysledku	8 (xsd:int)
http://linked.open...vavai/riv/projekt	Advanced self-adaptive low friction coatings based on transition metal dichalcogenides alloyed with carbon
http://linked.open...UplatneniVysledku	2010
http://linked.open...v/svazekPeriodika	204
http://linked.open...iv/tvurceVysledku	Kubart, Tomáš Berg, S. Nyberg, T. Wuttig, M. Austgen, M. Koehl, D. Pflug, A. Siemers, M.
http://linked.open...ain/vavai/riv/wos	000280048600019
issn	0257-8972
number of pages	5 (xsd:int)
http://localhost/t...ganizacniJednotka	21230
is http://linked.open...avai/riv/vysledek of	Modelling of sputtering yield amplification effect in reactive deposition of oxides Modelling of sputtering yield amplification effect in reactive deposition of oxides Modelling of sputtering yield amplification effect in reactive deposition of oxides

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