About: Synthesis and properties of W-Se-C coatings deposited by PVD in reactive and non-reactive processes     Goto   Sponge   NotDistinct   Permalink

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  • The WSeC coatings were deposited by either co-sputtering from WSe2 and C targets or by working in reactive mode in an Ar + CH4 atmosphere. Carbon content varied from 25 at.% up to 70 at.%, Se/W ratio of co-sputtered coatings was between 0.9 and 1.0, with no significant influence of the carbon content on their variations, while in the reactive process it reached values higher than 1.7. The hardness of the coatings was evaluated by nano-indentation, with values between 1.6 and 5.6 GPa. The structure of the coatings was analysed by X-ray diffraction in glancing mode, showing that the coatings have a quasi-amorphous structure. Finally, the selected samples were tested on pin-on-disc showing low friction properties of WSeC co-sputtered coatings.
  • The WSeC coatings were deposited by either co-sputtering from WSe2 and C targets or by working in reactive mode in an Ar + CH4 atmosphere. Carbon content varied from 25 at.% up to 70 at.%, Se/W ratio of co-sputtered coatings was between 0.9 and 1.0, with no significant influence of the carbon content on their variations, while in the reactive process it reached values higher than 1.7. The hardness of the coatings was evaluated by nano-indentation, with values between 1.6 and 5.6 GPa. The structure of the coatings was analysed by X-ray diffraction in glancing mode, showing that the coatings have a quasi-amorphous structure. Finally, the selected samples were tested on pin-on-disc showing low friction properties of WSeC co-sputtered coatings. (en)
Title
  • Synthesis and properties of W-Se-C coatings deposited by PVD in reactive and non-reactive processes
  • Synthesis and properties of W-Se-C coatings deposited by PVD in reactive and non-reactive processes (en)
skos:prefLabel
  • Synthesis and properties of W-Se-C coatings deposited by PVD in reactive and non-reactive processes
  • Synthesis and properties of W-Se-C coatings deposited by PVD in reactive and non-reactive processes (en)
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  • RIV/68407700:21230/09:00156860!RIV10-GA0-21230___
http://linked.open...avai/riv/aktivita
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  • P(GP106/07/P014)
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  • 10
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  • 345081
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  • RIV/68407700:21230/09:00156860
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  • coating; low friction; magnetron sputtering; WSe2 (en)
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  • GB - Spojené království Velké Británie a Severního Irska
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  • [FB0B7A503B51]
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  • 83
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  • Polcar, Tomáš
http://linked.open...ain/vavai/riv/wos
  • 000267505100014
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  • 0042-207X
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  • 21230
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