About: A simple model for the deposition of W-O coatings by reactive gas pulsing process

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About: A simple model for the deposition of W-O coatings by reactive gas pulsing process Goto Sponge NotDistinct Permalink

An Entity of Type : http://linked.opendata.cz/ontology/domain/vavai/Vysledek, within Data Space : linked.opendata.cz associated with source document(s)

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rdf:type	skos:Concept http://linked.opendata.cz/ontology/domain/vavai/Vysledek
Description	Jednoduchy model pro depozici W-O vrstev reaktivnim magnetronovym naprasovanim s pulsovanim kysliku. (cs) The conventional and RGPP process parameters (target potential, total pressure and deposition rate) and the corresponding chemical composition were used to build a simple model predicting the deposition rate and the average chemical composition of the coatings deposited by RGPP as a function of the pulsing parameters. It was shown that the measured total pressure could be used to calculate the deposition rate and the chemical composition of the RGPP coatings with reasonable precision. The conventional and RGPP process parameters (target potential, total pressure and deposition rate) and the corresponding chemical composition were used to build a simple model predicting the deposition rate and the average chemical composition of the coatings deposited by RGPP as a function of the pulsing parameters. It was shown that the measured total pressure could be used to calculate the deposition rate and the chemical composition of the RGPP coatings with reasonable precision. (en)
Title	A simple model for the deposition of W-O coatings by reactive gas pulsing process A simple model for the deposition of W-O coatings by reactive gas pulsing process (en) Jednoduchy model pro depozici W-O vrstev magnetronovym naprasovanim s pulzovanim reaktivniho plynu (cs)
skos:prefLabel	A simple model for the deposition of W-O coatings by reactive gas pulsing process A simple model for the deposition of W-O coatings by reactive gas pulsing process (en) Jednoduchy model pro depozici W-O vrstev magnetronovym naprasovanim s pulzovanim reaktivniho plynu (cs)
skos:notation	RIV/68407700:21230/08:06145482!RIV09-MSM-21230___
http://linked.open...avai/riv/aktivita	Z
http://linked.open...avai/riv/aktivity	Z(MSM6840770038)
http://linked.open...iv/cisloPeriodika	3
http://linked.open...vai/riv/dodaniDat	2009
http://linked.open...aciTvurceVysledku	Polcar, Tomáš
http://linked.open.../riv/druhVysledku	J - Článek v odborném periodiku
http://linked.open...iv/duvernostUdaju	S - Úplné a pravdivé údaje nepodléhající ochraně podle zvláštních právních předpisů
http://linked.open...titaPredkladatele	České vysoké učení technické v Praze / Fakulta elektrotechnická
http://linked.open...dnocenehoVysledku	354508
http://linked.open...ai/riv/idVysledku	RIV/68407700:21230/08:06145482
http://linked.open...riv/jazykVysledku	eng - angličtina
http://linked.open.../riv/klicovaSlova	multilayer; reactive gas pulsing; sputtering; tungsten oxide (en)
http://linked.open.../riv/klicoveSlovo	sputtering multilayer reactive gas pulsing tungsten oxide
http://linked.open...odStatuVydavatele	FR - Francouzská republika
http://linked.open...ontrolniKodProRIV	[C1532F925D41]
http://linked.open...i/riv/nazevZdroje	The European Physical Journal Applied Physics
http://linked.open...in/vavai/riv/obor	JI
http://linked.open...ichTvurcuVysledku	1 (xsd:int)
http://linked.open...cetTvurcuVysledku	4 (xsd:int)
http://linked.open...UplatneniVysledku	2008
http://linked.open...v/svazekPeriodika	43
http://linked.open...iv/tvurceVysledku	Cavaleiro, A. Polcar, Tomáš Carvalho, N.J.M. Parreira, N. M. G.
http://linked.open...ain/vavai/riv/wos	000258652300010
http://linked.open...n/vavai/riv/zamer	Decision Making and Control for Manufacturing III
issn	1286-0042
number of pages	5 (xsd:int)
http://localhost/t...ganizacniJednotka	21230
is http://linked.open...avai/riv/vysledek of	A simple model for the deposition of W-O coatings by reactive gas pulsing process A simple model for the deposition of W-O coatings by reactive gas pulsing process A simple model for the deposition of W-O coatings by reactive gas pulsing process A simple model for the deposition of W-O coatings by reactive gas pulsing process

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