A new Controlled Punch Through buffer for next generation IGBTs. The advanced shaping of the buffer profile was presented at 1200V IGBT with thickness close to 100um, but is applicable with advantage for all low voltage IGBT classes.
A new Controlled Punch Through buffer for next generation IGBTs. The advanced shaping of the buffer profile was presented at 1200V IGBT with thickness close to 100um, but is applicable with advantage for all low voltage IGBT classes. (en)
Byla vyvinuta technologie bufferu pro pristi generace IGBT. Prezentovano na IGBT s Vbr = 1200V na substratu tloustky kolem 100um. (cs)