About: Comparison of W-O Coatings Deposited by DC Reactive Magnetron Sputtering in Continuous and Pulsing Mode

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About: Comparison of W-O Coatings Deposited by DC Reactive Magnetron Sputtering in Continuous and Pulsing Mode Goto Sponge NotDistinct Permalink

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rdf:type	skos:Concept http://linked.opendata.cz/ontology/domain/vavai/Vysledek
Description	The deposition of the coating where done keeping constant the argon pressure at 0.2 Pa and the target current density (JW = 6 mA.cm-2). To cover all composition range for tungsten oxide prepared by CP (i.e. from W100 to W25O75), the oxygen flow 0 - 20 sccm was used. During the RGP process, the oxygen flow was pulsed using a square regulation signal defined by a pulsing period (T) and an oxygen injection time (tON). During tON the oxygen flow was 20 sccm and during tOFF (= T - ton), the oxygen flow was 0 sccm. The chemical composition were analysed by electron probe microanalysis (EPMA), the chemical profile by glow discharge optical emission spectroscopy (GDOES), the morphology were analysed by scanning electron microscope (SEM) and the colour represented by the CieLab* system was measured by colorimetry. The deposition of the coating where done keeping constant the argon pressure at 0.2 Pa and the target current density (JW = 6 mA.cm-2). To cover all composition range for tungsten oxide prepared by CP (i.e. from W100 to W25O75), the oxygen flow 0 - 20 sccm was used. During the RGP process, the oxygen flow was pulsed using a square regulation signal defined by a pulsing period (T) and an oxygen injection time (tON). During tON the oxygen flow was 20 sccm and during tOFF (= T - ton), the oxygen flow was 0 sccm. The chemical composition were analysed by electron probe microanalysis (EPMA), the chemical profile by glow discharge optical emission spectroscopy (GDOES), the morphology were analysed by scanning electron microscope (SEM) and the colour represented by the CieLab* system was measured by colorimetry. (en)
Title	Comparison of W-O Coatings Deposited by DC Reactive Magnetron Sputtering in Continuous and Pulsing Mode Comparison of W-O Coatings Deposited by DC Reactive Magnetron Sputtering in Continuous and Pulsing Mode (en)
skos:prefLabel	Comparison of W-O Coatings Deposited by DC Reactive Magnetron Sputtering in Continuous and Pulsing Mode Comparison of W-O Coatings Deposited by DC Reactive Magnetron Sputtering in Continuous and Pulsing Mode (en)
skos:notation	RIV/68407700:21230/07:00140088!RIV12-MSM-21230___
http://linked.open...avai/riv/aktivita	Z
http://linked.open...avai/riv/aktivity	Z(MSM6840770038)
http://linked.open...vai/riv/dodaniDat	2012
http://linked.open...aciTvurceVysledku	Polcar, Tomáš
http://linked.open.../riv/druhVysledku	O - Ostatní výsledky nezařaditelné do žádného z výše uvedených druhů výsledku
http://linked.open...iv/duvernostUdaju	S - Úplné a pravdivé údaje nepodléhající ochraně podle zvláštních právních předpisů
http://linked.open...titaPredkladatele	České vysoké učení technické v Praze / Fakulta elektrotechnická
http://linked.open...dnocenehoVysledku	414448
http://linked.open...ai/riv/idVysledku	RIV/68407700:21230/07:00140088
http://linked.open...riv/jazykVysledku	eng - angličtina
http://linked.open.../riv/klicovaSlova	magnetron sputtering; tungsten oxide (en)
http://linked.open.../riv/klicoveSlovo	magnetron sputtering tungsten oxide
http://linked.open...ontrolniKodProRIV	[AF5950A93523]
http://linked.open...in/vavai/riv/obor	JI
http://linked.open...ichTvurcuVysledku	1 (xsd:int)
http://linked.open...cetTvurcuVysledku	4 (xsd:int)
http://linked.open...UplatneniVysledku	2007
http://linked.open...iv/tvurceVysledku	Cavaleiro, A. Polcar, Tomáš Parreira, N. M. G. Vaz, F.
http://linked.open...n/vavai/riv/zamer	Decision Making and Control for Manufacturing III
http://localhost/t...ganizacniJednotka	21230

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