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Description
  • A physical vapor deposition (PVD) method using plasma discharge-glancing angle deposition (GLAD), based on a variation of the particle's incidence angle to the substrate, enables the formation of TiO2 thin films with oriented columnar nanostructure. The incidence angle influences crystalline, nanostructure, and surface properties of the deposited films. Images illustrating the GLAD PVD method and scanning electron microscopy images of the TiO2 thin films deposited with different incidence angles alpha are presented.
  • A physical vapor deposition (PVD) method using plasma discharge-glancing angle deposition (GLAD), based on a variation of the particle's incidence angle to the substrate, enables the formation of TiO2 thin films with oriented columnar nanostructure. The incidence angle influences crystalline, nanostructure, and surface properties of the deposited films. Images illustrating the GLAD PVD method and scanning electron microscopy images of the TiO2 thin films deposited with different incidence angles alpha are presented. (en)
Title
  • Sputter Deposition of Nanostructured TiO2 Thin Films
  • Sputter Deposition of Nanostructured TiO2 Thin Films (en)
skos:prefLabel
  • Sputter Deposition of Nanostructured TiO2 Thin Films
  • Sputter Deposition of Nanostructured TiO2 Thin Films (en)
skos:notation
  • RIV/68407700:21220/14:00223787!RIV15-MSM-21220___
http://linked.open...avai/riv/aktivita
http://linked.open...avai/riv/aktivity
  • P(EE2.3.30.0006), P(LO1207), S
http://linked.open...iv/cisloPeriodika
  • 10
http://linked.open...vai/riv/dodaniDat
http://linked.open...aciTvurceVysledku
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http://linked.open...dnocenehoVysledku
  • 46865
http://linked.open...ai/riv/idVysledku
  • RIV/68407700:21220/14:00223787
http://linked.open...riv/jazykVysledku
http://linked.open.../riv/klicovaSlova
  • Magnetrons; plasma applications; scanning electron microscopy; sputtering (en)
http://linked.open.../riv/klicoveSlovo
http://linked.open...odStatuVydavatele
  • US - Spojené státy americké
http://linked.open...ontrolniKodProRIV
  • [D9BC34461CAA]
http://linked.open...i/riv/nazevZdroje
  • IEEE Transactions on Plasma Science
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http://linked.open...ichTvurcuVysledku
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http://linked.open...v/svazekPeriodika
  • 42
http://linked.open...iv/tvurceVysledku
  • Kříž, Pavel
  • Bartoš, Petr
  • Horáková, Marta
  • Špatenka, Petr
  • Černý, Pavel
http://linked.open...ain/vavai/riv/wos
  • 000344548300233
issn
  • 0093-3813
number of pages
http://bibframe.org/vocab/doi
  • 10.1109/TPS.2014.2326896
http://localhost/t...ganizacniJednotka
  • 21220
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