About: Si and Gradient Layer Formed by RF PACVD Technology     Goto   Sponge   NotDistinct   Permalink

An Entity of Type : http://linked.opendata.cz/ontology/domain/vavai/Vysledek, within Data Space : linked.opendata.cz associated with source document(s)

AttributesValues
rdf:type
Description
  • They were investigated Si layers (and gradient layer) formed by RF PACVD technology. Si layers are useful and very important intermediate layers before depositing DLC coatings. We reached different Si layers by RF PACVD technology from Hexamethyldisiloxane - HMDSO with various diluted supporting gas (Ar, H2, N2) and we have investigated their properties. To compare the characteristics of layers we prepared gradient film, which contents carbon of CH4. Mechanical behavior of the substrate - coating systems was determined by nanoindentation load - displacement curves. Results show that the diluted gas is remarkable parameter for the properties of the Si intermediate layers.
  • They were investigated Si layers (and gradient layer) formed by RF PACVD technology. Si layers are useful and very important intermediate layers before depositing DLC coatings. We reached different Si layers by RF PACVD technology from Hexamethyldisiloxane - HMDSO with various diluted supporting gas (Ar, H2, N2) and we have investigated their properties. To compare the characteristics of layers we prepared gradient film, which contents carbon of CH4. Mechanical behavior of the substrate - coating systems was determined by nanoindentation load - displacement curves. Results show that the diluted gas is remarkable parameter for the properties of the Si intermediate layers. (en)
Title
  • Si and Gradient Layer Formed by RF PACVD Technology
  • Si and Gradient Layer Formed by RF PACVD Technology (en)
skos:prefLabel
  • Si and Gradient Layer Formed by RF PACVD Technology
  • Si and Gradient Layer Formed by RF PACVD Technology (en)
skos:notation
  • RIV/68407700:21220/11:00181099!RIV13-MSM-21220___
http://linked.open...avai/predkladatel
http://linked.open...avai/riv/aktivita
http://linked.open...avai/riv/aktivity
  • S
http://linked.open...iv/cisloPeriodika
  • 2
http://linked.open...vai/riv/dodaniDat
http://linked.open...aciTvurceVysledku
http://linked.open.../riv/druhVysledku
http://linked.open...iv/duvernostUdaju
http://linked.open...titaPredkladatele
http://linked.open...dnocenehoVysledku
  • 229168
http://linked.open...ai/riv/idVysledku
  • RIV/68407700:21220/11:00181099
http://linked.open...riv/jazykVysledku
http://linked.open.../riv/klicovaSlova
  • Si layers; RF PACVD; HMDSO; Nanoindentation (en)
http://linked.open.../riv/klicoveSlovo
http://linked.open...odStatuVydavatele
  • SK - Slovenská republika
http://linked.open...ontrolniKodProRIV
  • [94283187E753]
http://linked.open...i/riv/nazevZdroje
  • Výrobné inžinierstvo
http://linked.open...in/vavai/riv/obor
http://linked.open...ichTvurcuVysledku
http://linked.open...cetTvurcuVysledku
http://linked.open...UplatneniVysledku
http://linked.open...v/svazekPeriodika
  • 10
http://linked.open...iv/tvurceVysledku
  • Štěpánek, I.
  • Budinská, Zuzana
  • Tischler, Daniel
issn
  • 1335-7972
number of pages
http://localhost/t...ganizacniJednotka
  • 21220
is http://linked.open...avai/riv/vysledek of
Faceted Search & Find service v1.16.118 as of Jun 21 2024


Alternative Linked Data Documents: ODE     Content Formats:   [cxml] [csv]     RDF   [text] [turtle] [ld+json] [rdf+json] [rdf+xml]     ODATA   [atom+xml] [odata+json]     Microdata   [microdata+json] [html]    About   
This material is Open Knowledge   W3C Semantic Web Technology [RDF Data] Valid XHTML + RDFa
OpenLink Virtuoso version 07.20.3240 as of Jun 21 2024, on Linux (x86_64-pc-linux-gnu), Single-Server Edition (126 GB total memory, 41 GB memory in use)
Data on this page belongs to its respective rights holders.
Virtuoso Faceted Browser Copyright © 2009-2024 OpenLink Software