About: Investigation of ionized metal flux in enhanced high power impulse magnetron sputtering discharges

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Description	The metal ionized flux fraction and production of double charged metal ions Me2þ of different materials (Al, Cu, Fe, Ti) by High Power Impulse Magnetron Sputtering (HiPIMS) operated with and without a pre-ionization assistance is compared in the paper. The Electron Cyclotron Wave Resonance (ECWR) discharge was employed as the pre-ionization agent providing a seed of charge in the idle time of HiPIMS pulses. A modified grid-free biased quartz crystal microbalance was used to estimate the metal ionized flux fraction n. The energy-resolved mass spectrometry served as a complementary method to distinguish particular ion contributions to the total ionized flux onto the substrate. The ratio between densities of doubly Me2þ and singly Meþ charged metal ions was determined. It is shown that ECWR assistance enhances Me2þ production with respect of absorbed rf-power. The metal ionized flux fraction and production of double charged metal ions Me2þ of different materials (Al, Cu, Fe, Ti) by High Power Impulse Magnetron Sputtering (HiPIMS) operated with and without a pre-ionization assistance is compared in the paper. The Electron Cyclotron Wave Resonance (ECWR) discharge was employed as the pre-ionization agent providing a seed of charge in the idle time of HiPIMS pulses. A modified grid-free biased quartz crystal microbalance was used to estimate the metal ionized flux fraction n. The energy-resolved mass spectrometry served as a complementary method to distinguish particular ion contributions to the total ionized flux onto the substrate. The ratio between densities of doubly Me2þ and singly Meþ charged metal ions was determined. It is shown that ECWR assistance enhances Me2þ production with respect of absorbed rf-power. (en)
Title	Investigation of ionized metal flux in enhanced high power impulse magnetron sputtering discharges Investigation of ionized metal flux in enhanced high power impulse magnetron sputtering discharges (en)
skos:prefLabel	Investigation of ionized metal flux in enhanced high power impulse magnetron sputtering discharges Investigation of ionized metal flux in enhanced high power impulse magnetron sputtering discharges (en)
skos:notation	RIV/68378271:_____/14:00439381!RIV15-AV0-68378271
http://linked.open...avai/riv/aktivita	I P
http://linked.open...avai/riv/aktivity	I, P(LH12043)
http://linked.open...iv/cisloPeriodika	15
http://linked.open...vai/riv/dodaniDat	2015
http://linked.open...aciTvurceVysledku	Čada, Martin Hubička, Zdeněk
http://linked.open.../riv/druhVysledku	J - Článek v odborném periodiku
http://linked.open...iv/duvernostUdaju	S - Úplné a pravdivé údaje nepodléhající ochraně podle zvláštních právních předpisů
http://linked.open...titaPredkladatele	Fyzikální ústav AV ČR, v. v. i.
http://linked.open...dnocenehoVysledku	22736
http://linked.open...ai/riv/idVysledku	RIV/68378271:_____/14:00439381
http://linked.open...riv/jazykVysledku	eng - angličtina
http://linked.open.../riv/klicovaSlova	electron-impact ionization; physical vapor-deposition; cross-sections; plasma parameters; rate coefficients; low-pressure; energy; atoms; films; ions (en)
http://linked.open.../riv/klicoveSlovo	ions rate coefficients atoms plasma parameters physical vapor-deposition energy films electron-impact ionization cross-sections low-pressure
http://linked.open...odStatuVydavatele	US - Spojené státy americké
http://linked.open...ontrolniKodProRIV	[FC00739BF386]
http://linked.open...i/riv/nazevZdroje	Journal of Applied Physics
http://linked.open...in/vavai/riv/obor	BL
http://linked.open...ichTvurcuVysledku	2 (xsd:int)
http://linked.open...cetTvurcuVysledku	6 (xsd:int)
http://linked.open...vavai/riv/projekt	A Study of thin films systems based on Iron Pyrite (FeS2) for Photonic Applications.
http://linked.open...UplatneniVysledku	2014
http://linked.open...v/svazekPeriodika	115
http://linked.open...iv/tvurceVysledku	Hubička, Zdeněk Drache, S. Hippler, R. Straňák, V. Čada, Martin Tichý, M.
http://linked.open...ain/vavai/riv/wos	000335227100006
issn	0021-8979
number of pages	7 (xsd:int)
http://bibframe.org/vocab/doi	10.1063/1.4871635

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