About: Spectroscopic ellipsometry characterization of nano-crystalline diamondfilms prepared at various substrate temperatures and pulsed plasma frequencies using microwave plasma enhanced chemical vapor deposition apparatus with linear antenna delivery

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About: Spectroscopic ellipsometry characterization of nano-crystalline diamondfilms prepared at various substrate temperatures and pulsed plasma frequencies using microwave plasma enhanced chemical vapor deposition apparatus with linear antenna delivery Goto Sponge NotDistinct Permalink

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rdf:type	skos:Concept http://linked.opendata.cz/ontology/domain/vavai/Vysledek
Description	A series of nanocrystalline diamond (NCD) films were deposited by a custom made microwave plasma enhanced chemical vapor deposition apparatus with linear antenna delivery at different substrate temperatures (520–600 °C) and pulsed plasma frequencies (2.7–14.3 kHz) in a hydrogen rich working gas mixture of H2/CH4/CO2. Films were deposited onto naturally oxidized Si wafers pre-seeded with nanodiamond particles. Spectroellipsometry characterization of the NCD films was carried out considering various model structures (single and bi-layer models) and various NCD optical constant parameterizations (Tauc–Lorentz and effective medium approximation with different non-diamond component representations). A series of nanocrystalline diamond (NCD) films were deposited by a custom made microwave plasma enhanced chemical vapor deposition apparatus with linear antenna delivery at different substrate temperatures (520–600 °C) and pulsed plasma frequencies (2.7–14.3 kHz) in a hydrogen rich working gas mixture of H2/CH4/CO2. Films were deposited onto naturally oxidized Si wafers pre-seeded with nanodiamond particles. Spectroellipsometry characterization of the NCD films was carried out considering various model structures (single and bi-layer models) and various NCD optical constant parameterizations (Tauc–Lorentz and effective medium approximation with different non-diamond component representations). (en)
Title	Spectroscopic ellipsometry characterization of nano-crystalline diamondfilms prepared at various substrate temperatures and pulsed plasma frequencies using microwave plasma enhanced chemical vapor deposition apparatus with linear antenna delivery Spectroscopic ellipsometry characterization of nano-crystalline diamondfilms prepared at various substrate temperatures and pulsed plasma frequencies using microwave plasma enhanced chemical vapor deposition apparatus with linear antenna delivery (en)
skos:prefLabel	Spectroscopic ellipsometry characterization of nano-crystalline diamondfilms prepared at various substrate temperatures and pulsed plasma frequencies using microwave plasma enhanced chemical vapor deposition apparatus with linear antenna delivery Spectroscopic ellipsometry characterization of nano-crystalline diamondfilms prepared at various substrate temperatures and pulsed plasma frequencies using microwave plasma enhanced chemical vapor deposition apparatus with linear antenna delivery (en)
skos:notation	RIV/68378271:_____/14:00438739!RIV15-GA0-68378271
http://linked.open...avai/riv/aktivita	I P
http://linked.open...avai/riv/aktivity	I, P(GA13-31783S), P(LM2011026)
http://linked.open...iv/cisloPeriodika	1
http://linked.open...vai/riv/dodaniDat	2015
http://linked.open...aciTvurceVysledku	Jäger, Aleš Fekete, Ladislav Fendrych, František Taylor, Andrew
http://linked.open.../riv/druhVysledku	J - Článek v odborném periodiku
http://linked.open...iv/duvernostUdaju	S - Úplné a pravdivé údaje nepodléhající ochraně podle zvláštních právních předpisů
http://linked.open...titaPredkladatele	Fyzikální ústav AV ČR, v. v. i.
http://linked.open...dnocenehoVysledku	46585
http://linked.open...ai/riv/idVysledku	RIV/68378271:_____/14:00438739
http://linked.open...riv/jazykVysledku	eng - angličtina
http://linked.open.../riv/klicovaSlova	nanocrystalline diamond; thin films; microwave plasma-enhanced chemical vapor deposition; pulsed plasma; low deposition temperature (en)
http://linked.open.../riv/klicoveSlovo	thin films pulsed plasma nanocrystalline diamond low deposition temperature microwave plasma-enhanced chemical vapor deposition
http://linked.open...odStatuVydavatele	CH - Švýcarská konfederace
http://linked.open...ontrolniKodProRIV	[73A618CD184E]
http://linked.open...i/riv/nazevZdroje	Thin Solid Films
http://linked.open...in/vavai/riv/obor	BM
http://linked.open...ichTvurcuVysledku	4 (xsd:int)
http://linked.open...cetTvurcuVysledku	7 (xsd:int)
http://linked.open...vavai/riv/projekt	Studium procesu mezifázového přenosu náboje na borem a fosforem dopovaném diamantu v kontaktu s roztokem elektrolytu Laboratory of nanstructures and nanomaterials
http://linked.open...UplatneniVysledku	2014
http://linked.open...v/svazekPeriodika	571
http://linked.open...iv/tvurceVysledku	Janíček, P. Jäger, Aleš Mistrík, J. Fekete, Ladislav Fendrych, František Nesládek, M. Taylor, Andrew
http://linked.open...ain/vavai/riv/wos	000346053900037
issn	0040-6090
number of pages	8 (xsd:int)
http://bibframe.org/vocab/doi	10.1016/j.tsf.2014.10.071

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