About: Mask-free surface structuring of micro- and nanocrystalline diamond films by reactive ion plasma etching     Goto   Sponge   NotDistinct   Permalink

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  • In this technologically oriented study, the mask-free surface structuring of micro- and nanocrystalline diamond thin films is presented. The structuring of diamond films was performed by the reactive ion plasma etching in capacitively coupled radiofrequency plasma using different plasma chemistries (i.e. gas mixtures: O2, CF4, SF6 and Ar). We found that employing only oxygen plasma results in the formation of diamond nanowhiskers. Adding a small amount of CF4 makes the surface flatter. Argon containing gas mixture leads to smooth diamond surface without any whiskers. The etching mechanism is discussed with respect to the primary diamond morphology (micro- vs. nano-crystalline) and the used gas mixture.
  • In this technologically oriented study, the mask-free surface structuring of micro- and nanocrystalline diamond thin films is presented. The structuring of diamond films was performed by the reactive ion plasma etching in capacitively coupled radiofrequency plasma using different plasma chemistries (i.e. gas mixtures: O2, CF4, SF6 and Ar). We found that employing only oxygen plasma results in the formation of diamond nanowhiskers. Adding a small amount of CF4 makes the surface flatter. Argon containing gas mixture leads to smooth diamond surface without any whiskers. The etching mechanism is discussed with respect to the primary diamond morphology (micro- vs. nano-crystalline) and the used gas mixture. (en)
Title
  • Mask-free surface structuring of micro- and nanocrystalline diamond films by reactive ion plasma etching
  • Mask-free surface structuring of micro- and nanocrystalline diamond films by reactive ion plasma etching (en)
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  • Mask-free surface structuring of micro- and nanocrystalline diamond films by reactive ion plasma etching
  • Mask-free surface structuring of micro- and nanocrystalline diamond films by reactive ion plasma etching (en)
skos:notation
  • RIV/68378271:_____/14:00432632!RIV15-GA0-68378271
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  • I, P(FR-TI2/736), P(GAP108/12/0910), P(GAP108/12/0996)
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  • 7
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  • 27496
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  • RIV/68378271:_____/14:00432632
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  • micro- and nanocrystalline diamond; capacitively coupled plasma; reactive ion etching; nanostructuring; scanning electron microscopy (en)
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  • US - Spojené státy americké
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  • [4D86A5CD1CBD]
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  • Advanced Science, Engineering and Medicine
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  • 6
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  • Babchenko, Oleg
  • Hruška, Karel
  • Kromka, Alexander
  • Ižák, Tibor
  • Varga, Marián
  • Domonkos, Mária
issn
  • 2164-6627
number of pages
http://bibframe.org/vocab/doi
  • 10.1166/asem.2014.1573
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