About: Controlled structuring of self–assembled polystyrene microsphere arrays by two different plasma systems     Goto   Sponge   NotDistinct   Permalink

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  • In this study we present a successful manipulation of microspheres by reactive ion etching (RIE). A self-assembled monolayer close-packed array of monodisperse polystyrene microspheres (PM) with diameter of 471 nm was used as the primary template. The PM templates were processed in two different RIE systems: (i) capacitively coupled radiofrequency plasma (CCP) and (ii) dual plasma system which combines CCP and pulsed linear-antenna microwave plasma (PLAMWP). The influence of process conditions on the PM geometry was systematically studied by scanning electron microscopy (SEM). The process conditions were controlled by varying radiofrequency (RF) power, gas mixture (O2:CF4 ratio) and process duration.
  • In this study we present a successful manipulation of microspheres by reactive ion etching (RIE). A self-assembled monolayer close-packed array of monodisperse polystyrene microspheres (PM) with diameter of 471 nm was used as the primary template. The PM templates were processed in two different RIE systems: (i) capacitively coupled radiofrequency plasma (CCP) and (ii) dual plasma system which combines CCP and pulsed linear-antenna microwave plasma (PLAMWP). The influence of process conditions on the PM geometry was systematically studied by scanning electron microscopy (SEM). The process conditions were controlled by varying radiofrequency (RF) power, gas mixture (O2:CF4 ratio) and process duration. (en)
Title
  • Controlled structuring of self–assembled polystyrene microsphere arrays by two different plasma systems
  • Controlled structuring of self–assembled polystyrene microsphere arrays by two different plasma systems (en)
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  • Controlled structuring of self–assembled polystyrene microsphere arrays by two different plasma systems
  • Controlled structuring of self–assembled polystyrene microsphere arrays by two different plasma systems (en)
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  • RIV/68378271:_____/13:00425765!RIV14-GA0-68378271
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  • I, P(GA13-20110S), P(GAP108/12/0910)
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  • 67004
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  • RIV/68378271:_____/13:00425765
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  • nanosphere lithography; reactive ion etching; pulsed linear-antenna microwave plasma; polystyrene microspheres; Langmuir-Blodgett monolayers (en)
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  • [2961391A930A]
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  • Brno
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  • Ostrava
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  • NANOCON 2013 Conference Proceedings
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  • Kromka, Alexander
  • Ižák, Tibor
  • Proška, J.
  • Domonkos, Mária
  • Štolcová, L.
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number of pages
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  • Tanger s.r.o.
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  • 978-80-87294-44-4
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