About: RF magnetron sputtering of silver thin film in Ne, Ar and Kr discharges-plasma characterisation and surface morphology

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About: RF magnetron sputtering of silver thin film in Ne, Ar and Kr discharges-plasma characterisation and surface morphology Goto Sponge NotDistinct Permalink

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rdf:type	skos:Concept http://linked.opendata.cz/ontology/domain/vavai/Vysledek
Description	We have carried out a systematic study of the influence of Ne, Ar and Kr working gases on both plasma and film properties of RF magnetron sputtering of silver. The magnetron plasma was characterised by optical emission spectroscopy (OES) and mass spectrometry. Silver thin film morphology was examined by SEM and AFM. We studied influence of magnetron power and working gas pressure on the plasma composition. The magnetron power was varied from 25 to 100 W. The ambient pressure was changed from 0.5 Pa to 3 Pa. Both mass and OES spectra revealed presence of highly excited plasma in the substrate vicinity for all sputtering gases. The increasing OES signal intensities of Ag and Ag+ with increasing RF power and gas pressure were observed. However, in Ar discharge there was no Ag+ signal detected by OES at lower pressures of 0.5 Pa and 1 Pa. Similar profiles of the energy distributions of the ions with a maximum located around. We have carried out a systematic study of the influence of Ne, Ar and Kr working gases on both plasma and film properties of RF magnetron sputtering of silver. The magnetron plasma was characterised by optical emission spectroscopy (OES) and mass spectrometry. Silver thin film morphology was examined by SEM and AFM. We studied influence of magnetron power and working gas pressure on the plasma composition. The magnetron power was varied from 25 to 100 W. The ambient pressure was changed from 0.5 Pa to 3 Pa. Both mass and OES spectra revealed presence of highly excited plasma in the substrate vicinity for all sputtering gases. The increasing OES signal intensities of Ag and Ag+ with increasing RF power and gas pressure were observed. However, in Ar discharge there was no Ag+ signal detected by OES at lower pressures of 0.5 Pa and 1 Pa. Similar profiles of the energy distributions of the ions with a maximum located around. (en)
Title	RF magnetron sputtering of silver thin film in Ne, Ar and Kr discharges-plasma characterisation and surface morphology RF magnetron sputtering of silver thin film in Ne, Ar and Kr discharges-plasma characterisation and surface morphology (en)
skos:prefLabel	RF magnetron sputtering of silver thin film in Ne, Ar and Kr discharges-plasma characterisation and surface morphology RF magnetron sputtering of silver thin film in Ne, Ar and Kr discharges-plasma characterisation and surface morphology (en)
skos:notation	RIV/68378271:_____/13:00396058!RIV14-MSM-68378271
http://linked.open...avai/predkladatel	Fyzikální ústav AV ČR, v.v.i.
http://linked.open...avai/riv/aktivita	I P
http://linked.open...avai/riv/aktivity	I, P(GAP108/11/1298), P(GP202/09/P324), P(MEB091125)
http://linked.open...iv/cisloPeriodika	Suppl. 1
http://linked.open...vai/riv/dodaniDat	2014
http://linked.open...aciTvurceVysledku	Lančok, Ján Musil, Jindřich Pokorný, Petr Novotný, Michal Fekete, Ladislav Bulíř, Jiří
http://linked.open.../riv/druhVysledku	J - Článek v odborném periodiku
http://linked.open...iv/duvernostUdaju	S - Úplné a pravdivé údaje nepodléhající ochraně podle zvláštních právních předpisů
http://linked.open...titaPredkladatele	Fyzikální ústav AV ČR, v. v. i.
http://linked.open...dnocenehoVysledku	102882
http://linked.open...ai/riv/idVysledku	RIV/68378271:_____/13:00396058
http://linked.open...riv/jazykVysledku	eng - angličtina
http://linked.open.../riv/klicovaSlova	magnetron sputtering; silver; plasma characterisation; optical emission spectroscopy; mass spectrometry (en)
http://linked.open.../riv/klicoveSlovo	magnetron sputtering mass spectrometry optical emission spectroscopy plasma characterisation silver
http://linked.open...odStatuVydavatele	CH - Švýcarská konfederace
http://linked.open...ontrolniKodProRIV	[CB5FE00A9584]
http://linked.open...i/riv/nazevZdroje	Surface and Coatings Technology
http://linked.open...in/vavai/riv/obor	BM
http://linked.open...ichTvurcuVysledku	6 (xsd:int)
http://linked.open...cetTvurcuVysledku	7 (xsd:int)
http://linked.open...vavai/riv/projekt	Advanced system for monitoring of the growth of metal nanostructures on dielectric substrate Deposition and characterization of nanostructured hard coatings with tailored optical properties Detection layers based on composites of organocomplexes and nanoparticles for chemical sensors
http://linked.open...UplatneniVysledku	2013
http://linked.open...v/svazekPeriodika	228
http://linked.open...iv/tvurceVysledku	Lančok, Ján Musil, Jindřich Novotný, Michal Pokorný, Petr Bulíř, Jiří Fekete, Ladislav Čekada, M.
http://linked.open...ain/vavai/riv/wos	000323628400102
issn	0257-8972
number of pages	4 (xsd:int)
http://bibframe.org/vocab/doi	10.1016/j.surfcoat.2012.05.024

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