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  • Diamond thin films were grown by linear antenna microwave plasma CVD process over large areas (up to 20 10 cm2) from a hydrogen based gas mixture. The influence of the gas coDmposition (H2, CH4, CO2) and total gas pressure (0.1 and 2 mbar) on the film growth is presented. For CH4/H2 gas mixtures, the surface crystal size does not show dependence on the methane concentration and total pressure and remains below 50 nm as observed by SEM. Adding CO2 (up to 10%) significantly improves the growth rate. However, still no significant change of morphology is observed on films grown at 2 mbar. The crucial improvement of the diamond film purity (as detected by Raman spectroscopy) and crystal size is found for deposition at 0.1 mbar. In this case, crystals are as large as 500 nm and the growth rate increases up to 38 nm/h.
  • Diamond thin films were grown by linear antenna microwave plasma CVD process over large areas (up to 20 10 cm2) from a hydrogen based gas mixture. The influence of the gas coDmposition (H2, CH4, CO2) and total gas pressure (0.1 and 2 mbar) on the film growth is presented. For CH4/H2 gas mixtures, the surface crystal size does not show dependence on the methane concentration and total pressure and remains below 50 nm as observed by SEM. Adding CO2 (up to 10%) significantly improves the growth rate. However, still no significant change of morphology is observed on films grown at 2 mbar. The crucial improvement of the diamond film purity (as detected by Raman spectroscopy) and crystal size is found for deposition at 0.1 mbar. In this case, crystals are as large as 500 nm and the growth rate increases up to 38 nm/h. (en)
Title
  • Linear antenna microwave plasma CVD deposition of diamond films over large areas
  • Linear antenna microwave plasma CVD deposition of diamond films over large areas (en)
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  • Linear antenna microwave plasma CVD deposition of diamond films over large areas
  • Linear antenna microwave plasma CVD deposition of diamond films over large areas (en)
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  • RIV/68378271:_____/12:00377789!RIV13-GA0-68378271
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  • P(GAP108/11/0794), P(IAAX00100902), P(KAN400100701), P(LC510), Z(AV0Z10100521)
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  • 6
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  • 147113
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  • RIV/68378271:_____/12:00377789
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  • diamond; large area deposition; linear antenna microwave plasma (en)
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  • GB - Spojené království Velké Británie a Severního Irska
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  • [BD177E651727]
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  • Vacuum
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  • 86
http://linked.open...iv/tvurceVysledku
  • Babchenko, Oleg
  • Hruška, Karel
  • Kromka, Alexander
  • Rezek, Bohuslav
  • Ižák, Tibor
http://linked.open...ain/vavai/riv/wos
  • 000301018400048
http://linked.open...n/vavai/riv/zamer
issn
  • 0042-207X
number of pages
http://bibframe.org/vocab/doi
  • 10.1016/j.vacuum.2011.07.008
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