About: Highly ionized physical vapor deposition plasma source working at very low pressure

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rdf:type	skos:Concept http://linked.opendata.cz/ontology/domain/vavai/Vysledek
Description	Highly ionized discharge for physical vapor deposition at very low pressure is presented in the paper. The discharge is generated by electron cyclotron wave resonance (ECWR) which assists with ignition of high power impulse magnetron sputtering (HiPIMS) discharge. The magnetron gun (with Ti target) was built into the single-turn coil RF electrode of the ECWR facility. ECWR assistance provides pre-ionization effect which allows significant reduction of pressure during HiPIMS operation down to p=0.05 Pa; this is nearly more than an order of magnitude lower than at typical pressure ranges of HiPIMS discharges. We can confirm that nearly all sputtered particles are ionized (only Ti+ and Ti++ peaks are observed in the mass scan spectra). This corresponds well with high plasma density ne 1018m 3, measured during the HiPIMS pulse. Highly ionized discharge for physical vapor deposition at very low pressure is presented in the paper. The discharge is generated by electron cyclotron wave resonance (ECWR) which assists with ignition of high power impulse magnetron sputtering (HiPIMS) discharge. The magnetron gun (with Ti target) was built into the single-turn coil RF electrode of the ECWR facility. ECWR assistance provides pre-ionization effect which allows significant reduction of pressure during HiPIMS operation down to p=0.05 Pa; this is nearly more than an order of magnitude lower than at typical pressure ranges of HiPIMS discharges. We can confirm that nearly all sputtered particles are ionized (only Ti+ and Ti++ peaks are observed in the mass scan spectra). This corresponds well with high plasma density ne 1018m 3, measured during the HiPIMS pulse. (en)
Title	Highly ionized physical vapor deposition plasma source working at very low pressure Highly ionized physical vapor deposition plasma source working at very low pressure (en)
skos:prefLabel	Highly ionized physical vapor deposition plasma source working at very low pressure Highly ionized physical vapor deposition plasma source working at very low pressure (en)
skos:notation	RIV/68378271:_____/12:00377251!RIV13-TA0-68378271
http://linked.open...avai/predkladatel	Fyzikální ústav AV ČR, v.v.i.
http://linked.open...avai/riv/aktivita	P Z
http://linked.open...avai/riv/aktivity	P(GAP108/12/1941), P(GAP205/11/0386), P(TA01010517), Z(AV0Z10100522)
http://linked.open...iv/cisloPeriodika	14
http://linked.open...vai/riv/dodaniDat	2013
http://linked.open...aciTvurceVysledku	Čada, Martin Hubička, Zdeněk
http://linked.open.../riv/druhVysledku	J - Článek v odborném periodiku
http://linked.open...iv/duvernostUdaju	S - Úplné a pravdivé údaje nepodléhající ochraně podle zvláštních právních předpisů
http://linked.open...titaPredkladatele	Fyzikální ústav AV ČR, v. v. i.
http://linked.open...dnocenehoVysledku	139013
http://linked.open...ai/riv/idVysledku	RIV/68378271:_____/12:00377251
http://linked.open...riv/jazykVysledku	eng - angličtina
http://linked.open.../riv/klicovaSlova	magnetron; ECWR; low-pressure; sputtering; plasma diagnostics (en)
http://linked.open.../riv/klicoveSlovo	sputtering magnetron plasma diagnostics ECWR low-pressure
http://linked.open...odStatuVydavatele	US - Spojené státy americké
http://linked.open...ontrolniKodProRIV	[3FF590889C70]
http://linked.open...i/riv/nazevZdroje	Applied Physics Letters
http://linked.open...in/vavai/riv/obor	BL
http://linked.open...ichTvurcuVysledku	2 (xsd:int)
http://linked.open...cetTvurcuVysledku	7 (xsd:int)
http://linked.open...vavai/riv/projekt	Advanced experimental research of discharge plasma sources applied for deposition of nanostructured thin films Advanced preparation methods and experimental research of doped perovskite thin-film systems for high density energy storages Modern multilayer optical structures.
http://linked.open...UplatneniVysledku	2012
http://linked.open...v/svazekPeriodika	100
http://linked.open...iv/tvurceVysledku	Hubička, Zdeněk Drache, S. Hippler, R. Straňák, V. Čada, Martin Tichý, M. Herrendorf, A.-P.
http://linked.open...ain/vavai/riv/wos	000302567800013
http://linked.open...n/vavai/riv/zamer	Wave and Corpuscular Light Propagation, Optical Materials and Technology
issn	0003-6951
number of pages	3 (xsd:int)
http://bibframe.org/vocab/doi	10.1063/1.3699229
is http://linked.open...avai/riv/vysledek of	Highly ionized physical vapor deposition plasma source working at very low pressure

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