About: Effect of mid-frequency discharge assistance on dual-high power impulse magnetron sputtering

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rdf:type	skos:Concept http://linked.opendata.cz/ontology/domain/vavai/Vysledek
Description	The present paper is focused on time-resolved diagnostics of the simultaneous combination of dual mid frequency and dual-high power impulse magnetron sputtering discharges (so-called hybrid-dual-HiPIMS systems). The magnetrons in dual configuration are electrically confined, i.e. electrodes are alternately operated as an anode–cathode (and vice versa) during the sputtering. The dual MF discharge causes a pre-ionization effect which is an important feature because of: (i) a significant reduction of the working pressure by more than one order of magnitude, (ii) an increase of electron and ion energy, and (iii) an increase of the deposition rate. The time-resolved IVDF measurements revealed that ions with high energy generated at the cathode arrive at the substrate position about 25–30 μs after the HiPIMS pulse ignition. The effect of the hybrid system is illustrated on the deposition of Ti–Cu films. The present paper is focused on time-resolved diagnostics of the simultaneous combination of dual mid frequency and dual-high power impulse magnetron sputtering discharges (so-called hybrid-dual-HiPIMS systems). The magnetrons in dual configuration are electrically confined, i.e. electrodes are alternately operated as an anode–cathode (and vice versa) during the sputtering. The dual MF discharge causes a pre-ionization effect which is an important feature because of: (i) a significant reduction of the working pressure by more than one order of magnitude, (ii) an increase of electron and ion energy, and (iii) an increase of the deposition rate. The time-resolved IVDF measurements revealed that ions with high energy generated at the cathode arrive at the substrate position about 25–30 μs after the HiPIMS pulse ignition. The effect of the hybrid system is illustrated on the deposition of Ti–Cu films. (en)
Title	Effect of mid-frequency discharge assistance on dual-high power impulse magnetron sputtering Effect of mid-frequency discharge assistance on dual-high power impulse magnetron sputtering (en)
skos:prefLabel	Effect of mid-frequency discharge assistance on dual-high power impulse magnetron sputtering Effect of mid-frequency discharge assistance on dual-high power impulse magnetron sputtering (en)
skos:notation	RIV/68378271:_____/12:00377074!RIV13-TA0-68378271
http://linked.open...avai/predkladatel	Fyzikální ústav AV ČR, v.v.i.
http://linked.open...avai/riv/aktivita	P Z
http://linked.open...avai/riv/aktivity	P(GA202/07/0044), P(GA202/09/0800), P(GAP205/11/0386), P(GP202/09/P159), P(TA01010517), Z(AV0Z10100522)
http://linked.open...iv/cisloPeriodika	11-12
http://linked.open...vai/riv/dodaniDat	2013
http://linked.open...aciTvurceVysledku	Čada, Martin Hubička, Zdeněk
http://linked.open.../riv/druhVysledku	J - Článek v odborném periodiku
http://linked.open...iv/duvernostUdaju	S - Úplné a pravdivé údaje nepodléhající ochraně podle zvláštních právních předpisů
http://linked.open...titaPredkladatele	Fyzikální ústav AV ČR, v. v. i.
http://linked.open...dnocenehoVysledku	133151
http://linked.open...ai/riv/idVysledku	RIV/68378271:_____/12:00377074
http://linked.open...riv/jazykVysledku	eng - angličtina
http://linked.open.../riv/klicovaSlova	dual magnetron; HiPIMS; MF discharge; Ti-Cu films; IVDF; XRD (en)
http://linked.open.../riv/klicoveSlovo	dual magnetron XRD HiPIMS IVDF MF discharge Ti-Cu films
http://linked.open...odStatuVydavatele	CH - Švýcarská konfederace
http://linked.open...ontrolniKodProRIV	[C89FAAFE47A1]
http://linked.open...i/riv/nazevZdroje	Surface and Coatings Technology
http://linked.open...in/vavai/riv/obor	BL
http://linked.open...ichTvurcuVysledku	2 (xsd:int)
http://linked.open...cetTvurcuVysledku	9 (xsd:int)
http://linked.open...vavai/riv/projekt	Advanced experimental research of discharge plasma sources applied for deposition of nanostructured thin films Nonlinear Effects Near Antennas in Tokamaks Pulse mode and microwave plasma sources - research and applications An investigation of low-temperature plasma in systems of a planar magnetron, in systems with hollow cathodes and a microwave surfatron Modern multilayer optical structures.
http://linked.open...UplatneniVysledku	2012
http://linked.open...v/svazekPeriodika	206
http://linked.open...iv/tvurceVysledku	Hubička, Zdeněk Bogdanowicz, R. Drache, S. Hippler, R. Straňák, V. Čada, Martin Tichý, M. Wulff, H. Herrendorf, A.-P.
http://linked.open...ain/vavai/riv/wos	000301017300010
http://linked.open...n/vavai/riv/zamer	Wave and Corpuscular Light Propagation, Optical Materials and Technology
issn	0257-8972
number of pages	9 (xsd:int)
http://bibframe.org/vocab/doi	10.1016/j.surfcoat.2011.11.043
is http://linked.open...avai/riv/vysledek of	Effect of mid-frequency discharge assistance on dual-high power impulse magnetron sputtering

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