About: Growth and properties of Ti-Cu films with respect to plasma parameters in dual-magnetron sputtering discharges

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rdf:type	skos:Concept http://linked.opendata.cz/ontology/domain/vavai/Vysledek
Description	Properties of different methods of magnetron sputtering (dc-MS, dual-MS and dual-HiPIMS) are studied and compared with respect to intermetallic Ti-Cu film formation. The quality and features of thin films are strongly influenced by the energy of incoming particles. The ion velocity distribution functions (IVDFs) were measured by time-resolved retarding field analyzer (RFA) in the substrate position. Thin films were characterized by X-ray photoelectron spectroscopy (XPS), X-ray diffractometry (XRD) and X-ray reflectometry (XR). It was found that IVDFs measured in pulsed discharges exhibit double-peak distribution. The IVDFs reach the maximum at ion energies about 8 eV. The ion saturated current is highest in dual-HiPIMS discharge (5 μA/cm2) and is mostly represented by Cu+ and Ar+ ions. The mode of sputtering influences chemical composition. The copper forms polycrystalline fcc-phase while much smaller Ti particles enwraps the copper crystallites or are part of a solid solution. Properties of different methods of magnetron sputtering (dc-MS, dual-MS and dual-HiPIMS) are studied and compared with respect to intermetallic Ti-Cu film formation. The quality and features of thin films are strongly influenced by the energy of incoming particles. The ion velocity distribution functions (IVDFs) were measured by time-resolved retarding field analyzer (RFA) in the substrate position. Thin films were characterized by X-ray photoelectron spectroscopy (XPS), X-ray diffractometry (XRD) and X-ray reflectometry (XR). It was found that IVDFs measured in pulsed discharges exhibit double-peak distribution. The IVDFs reach the maximum at ion energies about 8 eV. The ion saturated current is highest in dual-HiPIMS discharge (5 μA/cm2) and is mostly represented by Cu+ and Ar+ ions. The mode of sputtering influences chemical composition. The copper forms polycrystalline fcc-phase while much smaller Ti particles enwraps the copper crystallites or are part of a solid solution. (en)
Title	Growth and properties of Ti-Cu films with respect to plasma parameters in dual-magnetron sputtering discharges Growth and properties of Ti-Cu films with respect to plasma parameters in dual-magnetron sputtering discharges (en)
skos:prefLabel	Growth and properties of Ti-Cu films with respect to plasma parameters in dual-magnetron sputtering discharges Growth and properties of Ti-Cu films with respect to plasma parameters in dual-magnetron sputtering discharges (en)
skos:notation	RIV/68378271:_____/11:00373839!RIV12-AV0-68378271
http://linked.open...avai/predkladatel	Fyzikální ústav AV ČR, v.v.i.
http://linked.open...avai/riv/aktivita	P S Z
http://linked.open...avai/riv/aktivity	P(1M06002), P(GAP205/11/0386), P(GP202/09/P159), P(KAN301370701), S, Z(AV0Z10100522), Z(MSM0021620834)
http://linked.open...iv/cisloPeriodika	2-3
http://linked.open...vai/riv/dodaniDat	2012
http://linked.open...aciTvurceVysledku	Čada, Martin Hubička, Zdeněk
http://linked.open.../riv/druhVysledku	J - Článek v odborném periodiku
http://linked.open...iv/duvernostUdaju	S - Úplné a pravdivé údaje nepodléhající ochraně podle zvláštních právních předpisů
http://linked.open...titaPredkladatele	Fyzikální ústav AV ČR, v. v. i.
http://linked.open...dnocenehoVysledku	201578
http://linked.open...ai/riv/idVysledku	RIV/68378271:_____/11:00373839
http://linked.open...riv/jazykVysledku	eng - angličtina
http://linked.open.../riv/klicovaSlova	dual magnetron; Ti-Cu film; HiPIMS; diagnostics; ion energy (en)
http://linked.open.../riv/klicoveSlovo	Ti-Cu film dual magnetron ion energy diagnostics HiPIMS
http://linked.open...odStatuVydavatele	DE - Spolková republika Německo
http://linked.open...ontrolniKodProRIV	[51C9ED8BF1B9]
http://linked.open...i/riv/nazevZdroje	European Physical Journal D
http://linked.open...in/vavai/riv/obor	BH
http://linked.open...ichTvurcuVysledku	2 (xsd:int)
http://linked.open...cetTvurcuVysledku	8 (xsd:int)
http://linked.open...vavai/riv/projekt	Optical structures, detection systems and relevant technologies for low photon number applications Advanced experimental research of discharge plasma sources applied for deposition of nanostructured thin films Nanostructured Macroscopic Systems - Technology and Characterisation An investigation of low-temperature plasma in systems of a planar magnetron, in systems with hollow cathodes and a microwave surfatron
http://linked.open...UplatneniVysledku	2011
http://linked.open...v/svazekPeriodika	64
http://linked.open...iv/tvurceVysledku	Hubička, Zdeněk Bogdanowicz, R. Drache, S. Hippler, R. Straňák, V. Čada, Martin Tichý, M. Wulff, H.
http://linked.open...ain/vavai/riv/wos	000296630800029
http://linked.open...n/vavai/riv/zamer	Wave and Corpuscular Light Propagation, Optical Materials and Technology Condensed Matter Physics – New Materials and Technologies
issn	1434-6060
number of pages	9 (xsd:int)
http://bibframe.org/vocab/doi	10.1140/epjd/e2011-20393-7
is http://linked.open...avai/riv/vysledek of	Growth and properties of Ti-Cu films with respect to plasma parameters in dual-magnetron sputtering discharges Growth and properties of Ti-Cu films with respect to plasma parameters in dual-magnetron sputtering discharges

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