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Description
| - n this work, we investigate the deposition of crystallization-promoting amorphous titania seed layers onto Cu-coated Kapton (R) HN foils for a subsequent PZT thin film fabrication thereon. Ultrathin TiO2-x layers with controlled stoichiometry were deposited by reactive sputtering at low substrate temperatures. X-ray photoelectron spectroscopy revealed that the Ti4+ ion in the seed layer was stable against Ar+ bombardment-induced reduction while CuO was reduced to Cu2O. Adsorbed moisture, organic solvents and carbon contaminations were quickly removed by Ar+ ion bombardment. (111)-textured PZT was fabricated on seed-layer-coated flexible substrates by means of a RF-modulated plasma jet system.
- n this work, we investigate the deposition of crystallization-promoting amorphous titania seed layers onto Cu-coated Kapton (R) HN foils for a subsequent PZT thin film fabrication thereon. Ultrathin TiO2-x layers with controlled stoichiometry were deposited by reactive sputtering at low substrate temperatures. X-ray photoelectron spectroscopy revealed that the Ti4+ ion in the seed layer was stable against Ar+ bombardment-induced reduction while CuO was reduced to Cu2O. Adsorbed moisture, organic solvents and carbon contaminations were quickly removed by Ar+ ion bombardment. (111)-textured PZT was fabricated on seed-layer-coated flexible substrates by means of a RF-modulated plasma jet system. (en)
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Title
| - Titania seed layers for PZT thin film growth on copper-coated Kapton films
- Titania seed layers for PZT thin film growth on copper-coated Kapton films (en)
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skos:prefLabel
| - Titania seed layers for PZT thin film growth on copper-coated Kapton films
- Titania seed layers for PZT thin film growth on copper-coated Kapton films (en)
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skos:notation
| - RIV/68378271:_____/09:00336552!RIV10-AV0-68378271
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http://linked.open...avai/riv/aktivita
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http://linked.open...avai/riv/aktivity
| - P(GC202/09/J017), P(KJB100100703), Z(AV0Z10100522)
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http://linked.open...iv/cisloPeriodika
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http://linked.open...vai/riv/dodaniDat
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http://linked.open...aciTvurceVysledku
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http://linked.open.../riv/druhVysledku
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http://linked.open...iv/duvernostUdaju
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http://linked.open...titaPredkladatele
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http://linked.open...dnocenehoVysledku
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http://linked.open...ai/riv/idVysledku
| - RIV/68378271:_____/09:00336552
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http://linked.open...riv/jazykVysledku
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http://linked.open.../riv/klicovaSlova
| - copper coated Kapton; seed layer; seed layer; plasma deposition; XPS (en)
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http://linked.open.../riv/klicoveSlovo
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http://linked.open...odStatuVydavatele
| - GB - Spojené království Velké Británie a Severního Irska
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http://linked.open...ontrolniKodProRIV
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http://linked.open...i/riv/nazevZdroje
| - Integrated Ferroelectrics
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http://linked.open...in/vavai/riv/obor
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http://linked.open...ichTvurcuVysledku
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http://linked.open...cetTvurcuVysledku
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http://linked.open...vavai/riv/projekt
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http://linked.open...UplatneniVysledku
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http://linked.open...v/svazekPeriodika
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http://linked.open...iv/tvurceVysledku
| - Dejneka, Alexandr
- Jastrabík, Lubomír
- Adolphi, B.
- Gerlach, G.
- Hubička, Zdeněk
- Suchaneck, G.
- Volkonskiy, O.
- Bertram, M.
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http://linked.open...ain/vavai/riv/wos
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http://linked.open...n/vavai/riv/zamer
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issn
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number of pages
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is http://linked.open...avai/riv/vysledek
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