About: Measurement of total energy flux density at a substrate during TiOx thin film deposition by using a plasma jet system

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rdf:type	skos:Concept http://linked.opendata.cz/ontology/domain/vavai/Vysledek
Description	The total energy flux density delivered to an electrically isolated substrate in a low-pressure pulsed DC hollow cathode plasma jet sputtering system during TiO2 thin film deposition has been quantified. The plasma source was operated in constant average current mode and in a mixture of argon and oxygen or only in pure argon working gas. A titanium nozzle served as the hollow cathode. The total energy flux density measurements were made using a planar calorimeter probe. The main results from the calorimeter probe showed clearly that the total energy flux density at the electrically isolated substrate decreases significantly with duty cycle from 100% (DC mode) to 10% at a given pulsing frequency 2.5 kHz. The total energy flux density delivered to an electrically isolated substrate in a low-pressure pulsed DC hollow cathode plasma jet sputtering system during TiO2 thin film deposition has been quantified. The plasma source was operated in constant average current mode and in a mixture of argon and oxygen or only in pure argon working gas. A titanium nozzle served as the hollow cathode. The total energy flux density measurements were made using a planar calorimeter probe. The main results from the calorimeter probe showed clearly that the total energy flux density at the electrically isolated substrate decreases significantly with duty cycle from 100% (DC mode) to 10% at a given pulsing frequency 2.5 kHz. (en)
Title	Measurement of total energy flux density at a substrate during TiOx thin film deposition by using a plasma jet system Measurement of total energy flux density at a substrate during TiOx thin film deposition by using a plasma jet system (en)
skos:prefLabel	Measurement of total energy flux density at a substrate during TiOx thin film deposition by using a plasma jet system Measurement of total energy flux density at a substrate during TiOx thin film deposition by using a plasma jet system (en)
skos:notation	RIV/68378271:_____/09:00334316!RIV10-AV0-68378271
http://linked.open...avai/riv/aktivita	P Z
http://linked.open...avai/riv/aktivity	P(KAN301370701), P(KJB100100707), Z(AV0Z10100522)
http://linked.open...iv/cisloPeriodika	4
http://linked.open...vai/riv/dodaniDat	2010
http://linked.open...aciTvurceVysledku	Čada, Martin Virostko, Petr Hubička, Zdeněk Kment, Štěpán
http://linked.open.../riv/druhVysledku	J - Článek v odborném periodiku
http://linked.open...iv/duvernostUdaju	S - Úplné a pravdivé údaje nepodléhající ochraně podle zvláštních právních předpisů
http://linked.open...titaPredkladatele	Fyzikální ústav AV ČR, v. v. i.
http://linked.open...dnocenehoVysledku	325080
http://linked.open...ai/riv/idVysledku	RIV/68378271:_____/09:00334316
http://linked.open...riv/jazykVysledku	eng - angličtina
http://linked.open.../riv/klicovaSlova	hollow cathode; plasma jet; sputtering; pulsed DC; energy influx on substrate; TiO2 (en)
http://linked.open.../riv/klicoveSlovo	sputtering TiO2 pulsed DC plasma jet hollow cathode energy influx on substrate
http://linked.open...odStatuVydavatele	GB - Spojené království Velké Británie a Severního Irska
http://linked.open...ontrolniKodProRIV	[191BC26B7749]
http://linked.open...i/riv/nazevZdroje	Vacuum
http://linked.open...in/vavai/riv/obor	BL
http://linked.open...ichTvurcuVysledku	4 (xsd:int)
http://linked.open...cetTvurcuVysledku	4 (xsd:int)
http://linked.open...vavai/riv/projekt	Nanostructured Macroscopic Systems - Technology and Characterisation Low-temperature plasmatic deposition of polycrystalline and nanocrystalline oxide thin films by systems with hollow cathodes
http://linked.open...UplatneniVysledku	2009
http://linked.open...v/svazekPeriodika	83
http://linked.open...iv/tvurceVysledku	Kment, Štěpán Hubička, Zdeněk Čada, Martin Virostko, Petr
http://linked.open...ain/vavai/riv/wos	000261824400008
http://linked.open...n/vavai/riv/zamer	Wave and Corpuscular Light Propagation, Optical Materials and Technology
issn	0042-207X
number of pages	7 (xsd:int)
is http://linked.open...avai/riv/vysledek of	Measurement of total energy flux density at a substrate during TiOx thin film deposition by using a plasma jet system Measurement of total energy flux density at a substrate during TiOx thin film deposition by using a plasma jet system Measurement of total energy flux density at a substrate during TiOx thin film deposition by using a plasma jet system Measurement of total energy flux density at a substrate during TiOx thin film deposition by using a plasma jet system

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