| Attributes | Values |
|---|
| rdf:type
| |
| Description
| - Nanocrystalline diamond thin films are grown on silicon and glass substrates by microwave plasma (MP)CVD from a gas mixture of methane and hydrogen at low substrate temperatures. The initial stages of diamond growth, i.e., i) the growth of individual nanometer-sized crystals and clusters, and ii) coalescence into a continuous layer, are investigated by diverse analytic techniques. AFM measurements reveal nearly unchanging surface roughness up to 40 min. XPS measurements detect changing of the surface composition from the very beginning of the growth process. The rapid carbon increase is assigned to the enlarging of the grown crystals and clusters. SEM images indicate a possible lateral growth type. The found dependences indicate that a two-dimensional growth mode takes place at low substrate temperatures. Grown nanocrystalline diamond films are optically transparent in a wide spectral range, and exhibit a high refractive index of 2.34.
- Nanocrystalline diamond thin films are grown on silicon and glass substrates by microwave plasma (MP)CVD from a gas mixture of methane and hydrogen at low substrate temperatures. The initial stages of diamond growth, i.e., i) the growth of individual nanometer-sized crystals and clusters, and ii) coalescence into a continuous layer, are investigated by diverse analytic techniques. AFM measurements reveal nearly unchanging surface roughness up to 40 min. XPS measurements detect changing of the surface composition from the very beginning of the growth process. The rapid carbon increase is assigned to the enlarging of the grown crystals and clusters. SEM images indicate a possible lateral growth type. The found dependences indicate that a two-dimensional growth mode takes place at low substrate temperatures. Grown nanocrystalline diamond films are optically transparent in a wide spectral range, and exhibit a high refractive index of 2.34. (en)
- Tenké vrstvy nankrystalického diamantu byli deponováni za nízkych teplot v mikrovlnnem plazmatu ve směsi metánu a vodíku. Počáteční fáze růstu, t.j. i) růst nanorozměrných krystalku a klastru a ii) koalescence těchto struktur v souvislou vrstvu, jsou studováni AFM, SEM a XPS technikami. AFM měření vykazujou témeř konstantní povrchovou drsnost po dobu 40 minut. Na druhé straně, XPS sepktra vykazují změnu složení povrchu od prvních minut procesu růstu. Zvyšováni zastoupebí uhlíku na povrchu je přirazeno růstu diamantových nanokrystalků. SEM obrázky indikují možní růst v laterárnim směre. Narostlé vrstvy byli opticky průhledné v širokém spektrálnym rozsahu, a jejich index lomu byl 2.34. (cs)
|
| Title
| - Formation of continuous nanocrystalline diamond layer on glass and silicon at low temperatures
- Nízkoteplotní růst souvislých diamantových vrstev na skle a na křemíku (cs)
- Formation of continuous nanocrystalline diamond layer on glass and silicon at low temperatures (en)
|
| skos:prefLabel
| - Formation of continuous nanocrystalline diamond layer on glass and silicon at low temperatures
- Nízkoteplotní růst souvislých diamantových vrstev na skle a na křemíku (cs)
- Formation of continuous nanocrystalline diamond layer on glass and silicon at low temperatures (en)
|
| skos:notation
| - RIV/68378271:_____/08:00319790!RIV09-AV0-68378271
|
| http://linked.open...avai/riv/aktivita
| |
| http://linked.open...avai/riv/aktivity
| - P(1M06002), P(KAN400100652), P(KAN400100701), P(LC510), Z(AV0Z10100521)
|
| http://linked.open...iv/cisloPeriodika
| |
| http://linked.open...vai/riv/dodaniDat
| |
| http://linked.open...aciTvurceVysledku
| |
| http://linked.open.../riv/druhVysledku
| |
| http://linked.open...iv/duvernostUdaju
| |
| http://linked.open...titaPredkladatele
| |
| http://linked.open...dnocenehoVysledku
| |
| http://linked.open...ai/riv/idVysledku
| - RIV/68378271:_____/08:00319790
|
| http://linked.open...riv/jazykVysledku
| |
| http://linked.open.../riv/klicovaSlova
| - AFM; low temperature growth; nanocrystalline diamond; SEM; XPS (en)
|
| http://linked.open.../riv/klicoveSlovo
| |
| http://linked.open...odStatuVydavatele
| - DE - Spolková republika Německo
|
| http://linked.open...ontrolniKodProRIV
| |
| http://linked.open...i/riv/nazevZdroje
| - Chemical Vapor Deposition
|
| http://linked.open...in/vavai/riv/obor
| |
| http://linked.open...ichTvurcuVysledku
| |
| http://linked.open...cetTvurcuVysledku
| |
| http://linked.open...vavai/riv/projekt
| |
| http://linked.open...UplatneniVysledku
| |
| http://linked.open...v/svazekPeriodika
| |
| http://linked.open...iv/tvurceVysledku
| - Kromka, Alexander
- Rezek, Bohuslav
- Ledinský, Martin
- Remeš, Zdeněk
- Zemek, Josef
- Vaněček, Milan
- Michalka, M.
- Potměšil, Jiří
|
| http://linked.open...ain/vavai/riv/wos
| |
| http://linked.open...n/vavai/riv/zamer
| |
| issn
| |
| number of pages
| |
| is http://linked.open...avai/riv/vysledek
of | |
![[RDF Data]](/fct/images/sw-rdf-blue.png)
![[cxml]](/fct/images/cxml_doc.png)
![[csv]](/fct/images/csv_doc.png)
![[text]](/fct/images/ntriples_doc.png)
![[turtle]](/fct/images/n3turtle_doc.png)
![[ld+json]](/fct/images/jsonld_doc.png)
![[rdf+json]](/fct/images/json_doc.png)
![[rdf+xml]](/fct/images/xml_doc.png)
![[atom+xml]](/fct/images/atom_doc.png)
![[html]](/fct/images/html_doc.png)