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| rdf:type
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| Description
| - Jedno a dvojtryskový plazmový systém byl použit pro depozici BaxSr1-xTiO3 tenkých vrstev na Si a vícevrstvý Si/SiO2/TiO2/Pt substrát. Dvě keramiky v jedné trysce nebo dvě jednotlivé trysky vyrobené z BaTiO3 a SrTiO3 byly reaktivně rozprašovány v RF modulovaném plasma-jetu. Parametry plazmatu byly stanoveny pomocí časově rozlišených měření. Elektronová hustota a efektivní elektronová teplota v blízkosti substrátu byly stanoveny pomocí Langmuirovy sondy, teplota neutrálních částic a poměr rozprášených atomů (zejména Ba a Sr) byly stanoveny pomocí optické emisní spektroskopie. Složení vrstev bylo bylo analyzováno pomocí elektronové mikrosondy. Naměřené hodnoty elektronové koncentrace blízko substrátu v průběhu aktivní části pulzu dosahovaly hodnoty 2x1016 m-3 a teplota byla přibližně 5 eV. Byla nalezena vysoká korelace mezi poměrem intenzit spektrálních čar Ba a Sr a mezi atomárním poměrem Ba a Sr ve výsledné BSTO vrstvě. XRD difrakce potvrdila přítomnost BSTO a STO perovskitových fází. (cs)
- We applied the single and the double hollow cathode plasma jet systems for deposition of BaxSr1-xTiO3 (BSTO) thin films on Si and on multi-layer Si/SiO2/TiO2/Pt substrates. Two ceramic inserts in a single nozzle or two separate nozzles made of BaTiO3 and SrTiO3 ceramics were reactively sputtered in the RF modulated plasma jet. Plasma parameters were determined by time-resolved measurements. Electron density and electron effective temperature at the substrate position were determined by Langmuir probe technique, temperature of neutral particles and ratio of sputtered atoms were estimated by optical emission spectroscopy. Measured electron concentration reached value 2x1016 m-3 during the active part of the duty cycle and resulting effective electron temperature was approximately 5 eV. High correlation between ratio of spectral intensity of Ba and Sr lines and ratio of Ba and Sr atoms in BSTO thin film was observed. XRD diffraction confirmed presence of BSTO and STO perovskite phase.
- We applied the single and the double hollow cathode plasma jet systems for deposition of BaxSr1-xTiO3 (BSTO) thin films on Si and on multi-layer Si/SiO2/TiO2/Pt substrates. Two ceramic inserts in a single nozzle or two separate nozzles made of BaTiO3 and SrTiO3 ceramics were reactively sputtered in the RF modulated plasma jet. Plasma parameters were determined by time-resolved measurements. Electron density and electron effective temperature at the substrate position were determined by Langmuir probe technique, temperature of neutral particles and ratio of sputtered atoms were estimated by optical emission spectroscopy. Measured electron concentration reached value 2x1016 m-3 during the active part of the duty cycle and resulting effective electron temperature was approximately 5 eV. High correlation between ratio of spectral intensity of Ba and Sr lines and ratio of Ba and Sr atoms in BSTO thin film was observed. XRD diffraction confirmed presence of BSTO and STO perovskite phase. (en)
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| Title
| - Low pressure plasma-jet systems and their application for deposition of ceramic thin films
- Low pressure plasma-jet systems and their application for deposition of ceramic thin films (en)
- Nízkotlaké plazma-jetové systémy a jejich aplikace pro depozici keramických tenkých vrstev (cs)
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| skos:prefLabel
| - Low pressure plasma-jet systems and their application for deposition of ceramic thin films
- Low pressure plasma-jet systems and their application for deposition of ceramic thin films (en)
- Nízkotlaké plazma-jetové systémy a jejich aplikace pro depozici keramických tenkých vrstev (cs)
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| skos:notation
| - RIV/68378271:_____/07:00097890!RIV08-AV0-68378271
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| http://linked.open.../vavai/riv/strany
| |
| http://linked.open...avai/riv/aktivita
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| http://linked.open...avai/riv/aktivity
| - P(1M06002), P(1QS100100563), Z(AV0Z10100522), Z(MSM0021620834)
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| http://linked.open...iv/cisloPeriodika
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| http://linked.open...vai/riv/dodaniDat
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| http://linked.open...aciTvurceVysledku
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| http://linked.open.../riv/druhVysledku
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| http://linked.open...iv/duvernostUdaju
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| http://linked.open...titaPredkladatele
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| http://linked.open...dnocenehoVysledku
| |
| http://linked.open...ai/riv/idVysledku
| - RIV/68378271:_____/07:00097890
|
| http://linked.open...riv/jazykVysledku
| |
| http://linked.open.../riv/klicovaSlova
| - interferometry; barrier torch discharge; phase shift; temperature (en)
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| http://linked.open.../riv/klicoveSlovo
| |
| http://linked.open...odStatuVydavatele
| |
| http://linked.open...ontrolniKodProRIV
| |
| http://linked.open...i/riv/nazevZdroje
| - Journal of Optoelectronics and Advanced Materials
|
| http://linked.open...in/vavai/riv/obor
| |
| http://linked.open...ichTvurcuVysledku
| |
| http://linked.open...cetTvurcuVysledku
| |
| http://linked.open...vavai/riv/projekt
| |
| http://linked.open...UplatneniVysledku
| |
| http://linked.open...v/svazekPeriodika
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| http://linked.open...iv/tvurceVysledku
| - Adámek, Petr
- Jastrabík, Lubomír
- Olejníček, Jiří
- Hubička, Zdeněk
- Tichý, M.
- Kudrna, Pavel
- Deyneka, Alexander
- Virostko, Petr
- Chichina, Mariya
- Šícha, M.
- Šíchová, H.
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| http://linked.open...n/vavai/riv/zamer
| |
| issn
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| number of pages
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| is http://linked.open...avai/riv/vysledek
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