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  • Comparing the values of etch rates calculated for nanosecond pulses with those measured for shorter pulses, we can study the influence of pulse duration on XUV ablation efficiency. The results of the experiments also show that the ablation rate increases while the wavelength decreases from the XUV spectral region toward X-rays, mainly due to increase of attenuation lengths at short wavelengths
  • Comparing the values of etch rates calculated for nanosecond pulses with those measured for shorter pulses, we can study the influence of pulse duration on XUV ablation efficiency. The results of the experiments also show that the ablation rate increases while the wavelength decreases from the XUV spectral region toward X-rays, mainly due to increase of attenuation lengths at short wavelengths (en)
  • Když porovnáme vypočtené účinnosti ablace nanosekundovými impulzy s těmi změřenými s femtosekundové impulzy můžeme posoudit vliv délky impulzu na účinnost krátkovlnné ablace. Naše experimentální výsledky dále ukazují, že s poklesem vlnavé délky od XUV do rtg spektrálního oboru ablační účinnost roste s rostoucí atenuační délkou (cs)
Title
  • Short-wavelength ablation of molecular solids: pulse duration and wavelength effects
  • Krátkovlnná ablace molekulárních pevných látek: vlivy vlnové délky a trvání impulzu (cs)
  • Short-wavelength ablation of molecular solids: pulse duration and wavelength effects (en)
skos:prefLabel
  • Short-wavelength ablation of molecular solids: pulse duration and wavelength effects
  • Krátkovlnná ablace molekulárních pevných látek: vlivy vlnové délky a trvání impulzu (cs)
  • Short-wavelength ablation of molecular solids: pulse duration and wavelength effects (en)
skos:notation
  • RIV/68378271:_____/05:00025580!RIV06-AV0-68378271
http://linked.open.../vavai/riv/strany
  • 033007/1;033007/11
http://linked.open...avai/riv/aktivita
http://linked.open...avai/riv/aktivity
  • P(1P04LA235), P(LN00A100), Z(AV0Z10100523)
http://linked.open...iv/cisloPeriodika
  • 3
http://linked.open...vai/riv/dodaniDat
http://linked.open...aciTvurceVysledku
http://linked.open.../riv/druhVysledku
http://linked.open...iv/duvernostUdaju
http://linked.open...titaPredkladatele
http://linked.open...dnocenehoVysledku
  • 542558
http://linked.open...ai/riv/idVysledku
  • RIV/68378271:_____/05:00025580
http://linked.open...riv/jazykVysledku
http://linked.open.../riv/klicovaSlova
  • ablation; XUV; x-rays; x-ray laser; material processing; microlithography (en)
http://linked.open.../riv/klicoveSlovo
http://linked.open...odStatuVydavatele
  • US - Spojené státy americké
http://linked.open...ontrolniKodProRIV
  • [A5D96DD762E0]
http://linked.open...i/riv/nazevZdroje
  • Journal of Microlithography Microfabrication and Microsystems
http://linked.open...in/vavai/riv/obor
http://linked.open...ichTvurcuVysledku
http://linked.open...cetTvurcuVysledku
http://linked.open...vavai/riv/projekt
http://linked.open...UplatneniVysledku
http://linked.open...v/svazekPeriodika
  • 4
http://linked.open...iv/tvurceVysledku
  • Juha, Libor
  • Krzywinski, J.
  • Kubát, Pavel
  • Kozlová, Michaela
  • Krása, Josef
  • Otčenášek, Zdeněk
  • Polan, Jiří
  • Pína, L.
  • Rocca, J. J.
  • Rus, Bedřich
  • Grisham, M. E.
  • Pelka, J. B.
  • Sobierajski, R.
  • Bittner, Michal
  • Pfeifer, Miroslav
  • Ryc, L.
  • Chvostová, Dagmar
  • Horváth, M.
  • Andrejczuk, A.
  • Bartnik, A.
  • Fiedorowicz, H.
  • Menoni, C. S.
  • Stupka, Michal
  • Rakowski, R.
  • Feldhaus, J.
  • Nietubyc, R.
  • Boody, F. P.
  • Präg R., Ansgar
  • Létal, V.
  • Vaschenko, G. O.
  • Mikolajczyk, J.
http://linked.open...n/vavai/riv/zamer
issn
  • 1537-1646
number of pages
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