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  • Electron beam lithography uses polymer electron resists mostly for recording of picture information. The behaviour of these polymer electron resists, under influence of the electron of the given energy, is expressed by the sensitivity curve. The curve of sensitivity is constructed as dependence of the relative change of thickness of the functional layer of resist, on the density of the absorbed energy.
  • Electron beam lithography uses polymer electron resists mostly for recording of picture information. The behaviour of these polymer electron resists, under influence of the electron of the given energy, is expressed by the sensitivity curve. The curve of sensitivity is constructed as dependence of the relative change of thickness of the functional layer of resist, on the density of the absorbed energy. (en)
Title
  • Optimization of reliefs of thin polymer films of resist for phase diffractive optical elements.
  • Optimization of reliefs of thin polymer films of resist for phase diffractive optical elements. (en)
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  • Optimization of reliefs of thin polymer films of resist for phase diffractive optical elements.
  • Optimization of reliefs of thin polymer films of resist for phase diffractive optical elements. (en)
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  • RIV/68081731:_____/99:12000093!RIV/2003/AV0/A12003/N
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  • 748778
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  • RIV/68081731:_____/99:12000093
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  • [916BC03D6BF7]
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  • Tři Studně [CZ]
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  • Prague
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  • New Trends in Surface nad Thin Film Physics and Engineering - International Summer School.
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  • Matějková, Jiřina
  • Matějka, František
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  • Physical section ot the Union of Czech Mathematician and Physicist
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