About: E-beam pattern generator BS600 and technology zoom

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An Entity of Type : http://linked.opendata.cz/ontology/domain/vavai/Vysledek, within Data Space : linked.opendata.cz associated with source document(s)

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rdf:type	skos:Concept http://linked.opendata.cz/ontology/domain/vavai/Vysledek
Description	This contribution deals with an electron beam pattern generator (ELG) working with a rectangular shape variable size electron beam originally developed at Institute of Scientific Instruments (ISI), later on commercialized as a BS600 series by former company Tesla, and recently upgraded by ISI cooperating with several partners. The key issue of this paper is a recently developed exposure mode which is called Technology Zoom (TZ mode) since its original concept until the recent progress. This ELG operating in the TZ mode provides three main advantages when compared to the standard exposure mode: higher exposure speed due to increased beam current density; finer stamp size adjustment and sharper stamp shape due to the stronger size reduction of the shaping aperture. Further, we discussed also some drawbacks and practical issues of the TZ mode. And finally, we summarize some results on real exposure examples. The new exposure mode (together with other recent upgrades) makes the BS600 pattern generator very useful for the nanotechnology patterning tasks and challenges. This contribution deals with an electron beam pattern generator (ELG) working with a rectangular shape variable size electron beam originally developed at Institute of Scientific Instruments (ISI), later on commercialized as a BS600 series by former company Tesla, and recently upgraded by ISI cooperating with several partners. The key issue of this paper is a recently developed exposure mode which is called Technology Zoom (TZ mode) since its original concept until the recent progress. This ELG operating in the TZ mode provides three main advantages when compared to the standard exposure mode: higher exposure speed due to increased beam current density; finer stamp size adjustment and sharper stamp shape due to the stronger size reduction of the shaping aperture. Further, we discussed also some drawbacks and practical issues of the TZ mode. And finally, we summarize some results on real exposure examples. The new exposure mode (together with other recent upgrades) makes the BS600 pattern generator very useful for the nanotechnology patterning tasks and challenges. (en)
Title	E-beam pattern generator BS600 and technology zoom E-beam pattern generator BS600 and technology zoom (en)
skos:prefLabel	E-beam pattern generator BS600 and technology zoom E-beam pattern generator BS600 and technology zoom (en)
skos:notation	RIV/68081731:_____/12:00390983!RIV13-AV0-68081731
http://linked.open...avai/predkladatel	Ústav přístrojové techniky AV ČR, v. v. i.
http://linked.open...avai/riv/aktivita	I P
http://linked.open...avai/riv/aktivity	I, P(ED0017/01/01), P(FR-TI1/576)
http://linked.open...vai/riv/dodaniDat	2013
http://linked.open...aciTvurceVysledku	Horáček, Miroslav Bok, Jan Kolařík, Vladimír Matějka, František Matějka, Milan Urbánek, Michal Král, Stanislav Krátký, Stanislav
http://linked.open.../riv/druhVysledku	D - Článek ve sborníku
http://linked.open...iv/duvernostUdaju	S - Úplné a pravdivé údaje nepodléhající ochraně podle zvláštních právních předpisů
http://linked.open...titaPredkladatele	Ústav přístrojové techniky AV ČR, v. v. i.
http://linked.open...dnocenehoVysledku	132677
http://linked.open...ai/riv/idVysledku	RIV/68081731:_____/12:00390983
http://linked.open...riv/jazykVysledku	eng - angličtina
http://linked.open.../riv/klicovaSlova	E-beam pattern generator; E-beam lithography; reduced size shaped beam (en)
http://linked.open.../riv/klicoveSlovo	E-beam lithography E-beam pattern generator reduced size shaped beam
http://linked.open...ontrolniKodProRIV	[D4C0254B7541]
http://linked.open...v/mistoKonaniAkce	Brno
http://linked.open...i/riv/mistoVydani	Ostrava
http://linked.open...i/riv/nazevZdroje	NANOCON 2012, 4th International Conference Proceedings
http://linked.open...in/vavai/riv/obor	JA
http://linked.open...ichTvurcuVysledku	8 (xsd:int)
http://linked.open...cetTvurcuVysledku	8 (xsd:int)
http://linked.open...vavai/riv/projekt	Optimization of electron-beam production technology APPLICATION LABORATORIES OF ADVANCED MICROTECHNOLOGIES AND NANOTECHNOLOGIES
http://linked.open...UplatneniVysledku	2012
http://linked.open...iv/tvurceVysledku	Horáček, Miroslav Matějka, Milan Urbánek, Michal Bok, Jan Kolařík, Vladimír Matějka, František Král, Stanislav Krátký, Stanislav
http://linked.open...vavai/riv/typAkce	WRD - Světová
http://linked.open.../riv/zahajeniAkce	2012-10-23 (xsd:date)
number of pages	4 (xsd:int)
http://purl.org/ne...btex#hasPublisher	TANGER Ltd
https://schema.org/isbn	978-80-87294-32-1
is http://linked.open...avai/riv/vysledek of	E-beam pattern generator BS600 and technology zoom

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