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  • Apparatus combining N2O plasma, DEZn transported in argon and UV irradiation of the deposition zone has been used. Vapor pressure during deposition was stabilised in the range 10 to 20 torr. ZnO layers were deposited on Si (100) and GaP (111) substrates. Growth rate changes in the range 2 to 90 μm/hour. Surface morphology at smaller growth rate was regular nanowalls type. More complex morphology, containing longer microrods and pyramids was obtained at high growth rate. Best sample grown at growth rate 80μm/hour demonstrate FWHM of the bound exciton peak 4meV.
  • Apparatus combining N2O plasma, DEZn transported in argon and UV irradiation of the deposition zone has been used. Vapor pressure during deposition was stabilised in the range 10 to 20 torr. ZnO layers were deposited on Si (100) and GaP (111) substrates. Growth rate changes in the range 2 to 90 μm/hour. Surface morphology at smaller growth rate was regular nanowalls type. More complex morphology, containing longer microrods and pyramids was obtained at high growth rate. Best sample grown at growth rate 80μm/hour demonstrate FWHM of the bound exciton peak 4meV. (en)
Title
  • MO CVD growth of ZnO with different growth rate
  • MO CVD growth of ZnO with different growth rate (en)
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  • MO CVD growth of ZnO with different growth rate
  • MO CVD growth of ZnO with different growth rate (en)
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  • RIV/67985882:_____/10:00356074!RIV12-AV0-67985882
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  • Z(AV0Z20670512)
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  • 271671
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  • RIV/67985882:_____/10:00356074
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  • ZnO; MOCVD; Growth rate (en)
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  • [BADE7AFCA209]
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  • Smolenice
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  • Conference Proceedings ASDAM 2010
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  • Gladkov, Petr
  • Grym, Jan
  • Nohavica, Dušan
  • Jarchovský, Zdeněk
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number of pages
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  • 10.1109/ASDAM.2010.5666333
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  • IEEE
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  • 978-1-4244-8574-1
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