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  • The porous structures were formed by anodic oxidation of InP(001) substrates in aqueous HCl solution. The structural parameters of the sublayers were varied by changing the electrochemical etching mode (potentiostatic/galvanostatic). The X-ray scattering intensity maps near the InP 004 reflection are obtained. A model for scattering from such systems is proposed based on the statistical dynamical diffraction theory. Theoretical scattering maps have been fitted to the experimental ones. It is shown that a mathematical analysis of the scattering intensity maps makes it possible to determine the structural parameters of sublayers. The reconstructed parameters (thickness, strain, and porosity of sublayers and the shape and arrangement of pores) are in satisfactory agreement with the scanning electron microscopy data.
  • The porous structures were formed by anodic oxidation of InP(001) substrates in aqueous HCl solution. The structural parameters of the sublayers were varied by changing the electrochemical etching mode (potentiostatic/galvanostatic). The X-ray scattering intensity maps near the InP 004 reflection are obtained. A model for scattering from such systems is proposed based on the statistical dynamical diffraction theory. Theoretical scattering maps have been fitted to the experimental ones. It is shown that a mathematical analysis of the scattering intensity maps makes it possible to determine the structural parameters of sublayers. The reconstructed parameters (thickness, strain, and porosity of sublayers and the shape and arrangement of pores) are in satisfactory agreement with the scanning electron microscopy data. (en)
Title
  • X-ray diffraction analysis of multilayer porous InP(001) structure
  • X-ray diffraction analysis of multilayer porous InP(001) structure (en)
skos:prefLabel
  • X-ray diffraction analysis of multilayer porous InP(001) structure
  • X-ray diffraction analysis of multilayer porous InP(001) structure (en)
skos:notation
  • RIV/67985882:_____/10:00351779!RIV11-AV0-67985882
http://linked.open...avai/riv/aktivita
http://linked.open...avai/riv/aktivity
  • Z(AV0Z20670512)
http://linked.open...iv/cisloPeriodika
  • 2
http://linked.open...vai/riv/dodaniDat
http://linked.open...aciTvurceVysledku
http://linked.open.../riv/druhVysledku
http://linked.open...iv/duvernostUdaju
http://linked.open...titaPredkladatele
http://linked.open...dnocenehoVysledku
  • 299049
http://linked.open...ai/riv/idVysledku
  • RIV/67985882:_____/10:00351779
http://linked.open...riv/jazykVysledku
http://linked.open.../riv/klicovaSlova
  • silicon layers; INP (en)
http://linked.open.../riv/klicoveSlovo
http://linked.open...odStatuVydavatele
  • RU - Ruská federace
http://linked.open...ontrolniKodProRIV
  • [5922A19AF063]
http://linked.open...i/riv/nazevZdroje
  • Crystallography Reports
http://linked.open...in/vavai/riv/obor
http://linked.open...ichTvurcuVysledku
http://linked.open...cetTvurcuVysledku
http://linked.open...UplatneniVysledku
http://linked.open...v/svazekPeriodika
  • 55
http://linked.open...iv/tvurceVysledku
  • Gladkov, Petr
  • Nohavica, Dušan
  • Lomov, A. A.
  • Novikov, D. V.
  • Vasil'ev, A. L.
  • Kartsev, A. A.
  • Punegov, V. I.
http://linked.open...ain/vavai/riv/wos
  • 000276507600003
http://linked.open...n/vavai/riv/zamer
issn
  • 1063-7745
number of pages
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