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  • A correlation between the resistivity-voltage dependences of the hydrogenated SiN/Si(111) films and the photo-induced third-harmonic generation (PITHG) at lambda = 1064 nm in the reflected light regime was found. The contribution to the PITHG is both due to linear photo-induced surface changes as well as due to the hydrogen dopants. When the fundamental power density increases to higher than 1.2 GW/cm(2), there occurs a drastic decrease of the PITHG. Maximal PITHG changes are observed at a pump-probe delay time about 18 ps and the value of the PITHG slightly increases with the enhanced applied dc-electric field during illumination by a third-harmonic laser beam as a photo-inducing one. The deviation from the tripled frequency wavelength to higher wavelengths substantially suppresses the output PITHG signal. The crucial role of the interface trapping levels and silicon-hydrogen charge transfer is shown.
  • A correlation between the resistivity-voltage dependences of the hydrogenated SiN/Si(111) films and the photo-induced third-harmonic generation (PITHG) at lambda = 1064 nm in the reflected light regime was found. The contribution to the PITHG is both due to linear photo-induced surface changes as well as due to the hydrogen dopants. When the fundamental power density increases to higher than 1.2 GW/cm(2), there occurs a drastic decrease of the PITHG. Maximal PITHG changes are observed at a pump-probe delay time about 18 ps and the value of the PITHG slightly increases with the enhanced applied dc-electric field during illumination by a third-harmonic laser beam as a photo-inducing one. The deviation from the tripled frequency wavelength to higher wavelengths substantially suppresses the output PITHG signal. The crucial role of the interface trapping levels and silicon-hydrogen charge transfer is shown. (en)
Title
  • Nonlinear optical study of amorphous SiN : H films on the Si(111) substrate
  • Nonlinear optical study of amorphous SiN : H films on the Si(111) substrate (en)
skos:prefLabel
  • Nonlinear optical study of amorphous SiN : H films on the Si(111) substrate
  • Nonlinear optical study of amorphous SiN : H films on the Si(111) substrate (en)
skos:notation
  • RIV/67179843:_____/08:00343301!RIV11-AV0-67179843
http://linked.open...avai/riv/aktivita
http://linked.open...avai/riv/aktivity
  • Z(AV0Z60870520), Z(MSM6007665808)
http://linked.open...iv/cisloPeriodika
  • 8
http://linked.open...vai/riv/dodaniDat
http://linked.open...aciTvurceVysledku
http://linked.open.../riv/druhVysledku
http://linked.open...iv/duvernostUdaju
http://linked.open...titaPredkladatele
http://linked.open...dnocenehoVysledku
  • 382893
http://linked.open...ai/riv/idVysledku
  • RIV/67179843:_____/08:00343301
http://linked.open...riv/jazykVysledku
http://linked.open.../riv/klicovaSlova
  • 2nd-harmonic; generation; thin-films (en)
http://linked.open.../riv/klicoveSlovo
http://linked.open...odStatuVydavatele
  • US - Spojené státy americké
http://linked.open...ontrolniKodProRIV
  • [E8C3A72354E8]
http://linked.open...i/riv/nazevZdroje
  • Laser Physics
http://linked.open...in/vavai/riv/obor
http://linked.open...ichTvurcuVysledku
http://linked.open...cetTvurcuVysledku
http://linked.open...UplatneniVysledku
http://linked.open...v/svazekPeriodika
  • 18
http://linked.open...iv/tvurceVysledku
  • Mandracci, P.
  • Reshak, Ali H
  • Claudet, B.
  • Michalska-Malecka, K.
  • Plucinsky, K.
http://linked.open...ain/vavai/riv/wos
  • 000258408000016
http://linked.open...n/vavai/riv/zamer
issn
  • 1054-660X
number of pages
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