About: Phase retrieval from the spectral interference signal used to measure thickness of SiO2 thin film on silicon wafer

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About: Phase retrieval from the spectral interference signal used to measure thickness of SiO2 thin film on silicon wafer Goto Sponge NotDistinct Permalink

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rdf:type	skos:Concept http://linked.opendata.cz/ontology/domain/vavai/Vysledek
Description	Obnovení fáze ze spektrlního interferenčního signálu použitého pro měření loušťky tenké vrstvy SiO2 na křemíkovém waferu (cs) A new method of phase retrieval from the spectral interference signal is presented, which is based on the use of a windowed Fourier transform in the wavelength domain. The phase retrieved by the method is utilized for measuring the thickness of SiO2 thin film on a silicon wafer. The numerical simulations are performed to demonstrate high precision of the phase retrieval. The feasibility of the method is confirmed in processing experimental data from a slightly dispersive Michelson interferometer with one of the mirrors replaced by SiO2 thin film on the silicon wafer. We determine the thin-film thickness for four samples provided that the optical constants for all the materials involved in the experiment are known. We confirm very good agreement with the previous results obtained by the fitting of the recorded channelled spectra to the theoretical ones. A new method of phase retrieval from the spectral interference signal is presented, which is based on the use of a windowed Fourier transform in the wavelength domain. The phase retrieved by the method is utilized for measuring the thickness of SiO2 thin film on a silicon wafer. The numerical simulations are performed to demonstrate high precision of the phase retrieval. The feasibility of the method is confirmed in processing experimental data from a slightly dispersive Michelson interferometer with one of the mirrors replaced by SiO2 thin film on the silicon wafer. We determine the thin-film thickness for four samples provided that the optical constants for all the materials involved in the experiment are known. We confirm very good agreement with the previous results obtained by the fitting of the recorded channelled spectra to the theoretical ones. (en)
Title	Phase retrieval from the spectral interference signal used to measure thickness of SiO2 thin film on silicon wafer Phase retrieval from the spectral interference signal used to measure thickness of SiO2 thin film on silicon wafer (en) Obnovení fáze ze spektrlního interferenčního signálu použitého pro měření loušťky tenké vrstvy SiO2 na křemíkovém waferu (cs)
skos:prefLabel	Phase retrieval from the spectral interference signal used to measure thickness of SiO2 thin film on silicon wafer Phase retrieval from the spectral interference signal used to measure thickness of SiO2 thin film on silicon wafer (en) Obnovení fáze ze spektrlního interferenčního signálu použitého pro měření loušťky tenké vrstvy SiO2 na křemíkovém waferu (cs)
skos:notation	RIV/61989100:27350/07:00016552!RIV08-GA0-27350___
http://linked.open.../vavai/riv/strany	397-4037
http://linked.open...avai/riv/aktivita	P Z
http://linked.open...avai/riv/aktivity	P(GA202/06/0531), Z(MSM6198910016)
http://linked.open...iv/cisloPeriodika	3
http://linked.open...vai/riv/dodaniDat	2008
http://linked.open...aciTvurceVysledku	Hlubina, Petr Ciprian, Dalibor Luňáček, Jiří
http://linked.open.../riv/druhVysledku	J - Článek v odborném periodiku
http://linked.open...iv/duvernostUdaju	S - Úplné a pravdivé údaje nepodléhající ochraně podle zvláštních právních předpisů
http://linked.open...titaPredkladatele	Vysoká škola báňská - Technická univerzita Ostrava / Hornicko-geologická fakulta
http://linked.open...dnocenehoVysledku	441168
http://linked.open...ai/riv/idVysledku	RIV/61989100:27350/07:00016552
http://linked.open...riv/jazykVysledku	eng - angličtina
http://linked.open.../riv/klicovaSlova	WAVELENGTH DEPENDENCE; INTERFEROMETRY; REFLECTION (en)
http://linked.open.../riv/klicoveSlovo	WAVELENGTH DEPENDENCE INTERFEROMETRY REFLECTION
http://linked.open...odStatuVydavatele	US - Spojené státy americké
http://linked.open...ontrolniKodProRIV	[81063031F444]
http://linked.open...i/riv/nazevZdroje	APPLIED PHYSICS B-LASERS AND OPTICS
http://linked.open...in/vavai/riv/obor	BH
http://linked.open...ichTvurcuVysledku	3 (xsd:int)
http://linked.open...cetTvurcuVysledku	4 (xsd:int)
http://linked.open...vavai/riv/projekt	Reflection and waveguiding effects in magnetic nanostructures
http://linked.open...UplatneniVysledku	2007
http://linked.open...v/svazekPeriodika	88
http://linked.open...iv/tvurceVysledku	Ciprian, Dalibor Hlubina, Petr Luňáček, Jiří Chlebus, R.
http://linked.open...n/vavai/riv/zamer	Syntéza, struktura a vlastnosti nanomateriálů založených na bázi interkalovaných fylosylikátů
issn	0946-2171
number of pages	7 (xsd:int)
http://localhost/t...ganizacniJednotka	27350
is http://linked.open...avai/riv/vysledek of	Phase retrieval from the spectral interference signal used to measure thickness of SiO2 thin film on silicon wafer Phase retrieval from the spectral interference signal used to measure thickness of SiO2 thin film on silicon wafer Phase retrieval from the spectral interference signal used to measure thickness of SiO2 thin film on silicon wafer

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