About: An extreme ultraviolet interferometer suitable to generate dense interference pattern

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An Entity of Type : http://linked.opendata.cz/ontology/domain/vavai/Vysledek, within Data Space : linked.opendata.cz associated with source document(s)

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rdf:type	skos:Concept http://linked.opendata.cz/ontology/domain/vavai/Vysledek
Description	t has been designed a new type of interferometer working in extreme ultraviolet (XUV) region and intended for direct imprinting of densest possible (for given wavelength) interference pattern into a substrate. The interferometer belongs to the wave-front division category: each of its two aspheric mirrors reflects approximately one half of incoming laser beam and focuses it into a point image. Both focused beams have to intersect each other, and in the intersection region an interference pattern is generated. The closer the intersection region is to the above-mentioned point images, the smaller the interference field is, but simultaneously the smaller the fringe-pitch is. This paper describes interferometer design (inclusive fringe-pitch calculation, and inclusive design of multilayer reflection coatings for the wavelength 46.9 nm (Ar8+ laser) -ensuring equal reflectivity at different reflection angles).The interferometer design is supplemented not only by ray-tracing verification t has been designed a new type of interferometer working in extreme ultraviolet (XUV) region and intended for direct imprinting of densest possible (for given wavelength) interference pattern into a substrate. The interferometer belongs to the wave-front division category: each of its two aspheric mirrors reflects approximately one half of incoming laser beam and focuses it into a point image. Both focused beams have to intersect each other, and in the intersection region an interference pattern is generated. The closer the intersection region is to the above-mentioned point images, the smaller the interference field is, but simultaneously the smaller the fringe-pitch is. This paper describes interferometer design (inclusive fringe-pitch calculation, and inclusive design of multilayer reflection coatings for the wavelength 46.9 nm (Ar8+ laser) -ensuring equal reflectivity at different reflection angles).The interferometer design is supplemented not only by ray-tracing verification (en)
Title	An extreme ultraviolet interferometer suitable to generate dense interference pattern An extreme ultraviolet interferometer suitable to generate dense interference pattern (en)
skos:prefLabel	An extreme ultraviolet interferometer suitable to generate dense interference pattern An extreme ultraviolet interferometer suitable to generate dense interference pattern (en)
skos:notation	RIV/61389021:_____/14:00436667!RIV15-AV0-61389021
http://linked.open...avai/riv/aktivita	I P
http://linked.open...avai/riv/aktivity	I, P(LG13029)
http://linked.open...vai/riv/dodaniDat	2015
http://linked.open...aciTvurceVysledku	Melich, Radek Prukner, Václav Štraus, Jaroslav Koláček, Karel Schmidt, Jiří Frolov, Oleksandr
http://linked.open.../riv/druhVysledku	D - Článek ve sborníku
http://linked.open...iv/duvernostUdaju	S - Úplné a pravdivé údaje nepodléhající ochraně podle zvláštních právních předpisů
http://linked.open...titaPredkladatele	Ústav fyziky plazmatu AV ČR, v. v. i.
http://linked.open...dnocenehoVysledku	2491
http://linked.open...ai/riv/idVysledku	RIV/61389021:_____/14:00436667
http://linked.open...riv/jazykVysledku	eng - angličtina
http://linked.open.../riv/klicovaSlova	Extreme ultraviolet radiation; XUV interferometer; ablation threshold contour; XUV photodesorption; direct nanopatterningby XUV; application of Ar8+ XUV laser (en)
http://linked.open.../riv/klicoveSlovo	Extreme ultraviolet radiation XUV interferometer XUV photodesorption ablation threshold contour application of Ar8+ XUV laser direct nanopatterningby XUV
http://linked.open...ontrolniKodProRIV	[7D8A5BB88DD9]
http://linked.open...v/mistoKonaniAkce	San Diego
http://linked.open...i/riv/mistoVydani	Bellingham
http://linked.open...i/riv/nazevZdroje	Proceedings of SPIE 9206, Advances in Metrology for X-Ray and EUV Optics V
http://linked.open...in/vavai/riv/obor	BH
http://linked.open...ichTvurcuVysledku	6 (xsd:int)
http://linked.open...cetTvurcuVysledku	6 (xsd:int)
http://linked.open...vavai/riv/projekt	Research in the Frame of the Internatinal Center for Dense Magnetized Plasmas
http://linked.open...UplatneniVysledku	2014
http://linked.open...iv/tvurceVysledku	Melich, Radek Frolov, Oleksandr Koláček, Karel Prukner, Václav Schmidt, Jiří Štraus, Jaroslav
http://linked.open...vavai/riv/typAkce	WRD - Světová
http://linked.open...ain/vavai/riv/wos	000343876300008
http://linked.open.../riv/zahajeniAkce	2014-08-19 (xsd:date)
issn	0277-786X
number of pages	10 (xsd:int)
http://bibframe.org/vocab/doi	10.1117/12.2061858
http://purl.org/ne...btex#hasPublisher	SPIE
https://schema.org/isbn	978-1-62841-233-8

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