About: A new method of determination of ablation threshold contour in the spot of focused XUV laser beam of nanosecond duration     Goto   Sponge   NotDistinct   Permalink

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  • For nanosecond laser pulses the material removal efficiency in the desorption zone spans from 0 to 90% and, hence, it is transition to 100% characteristic for ablation zone is hardly distinguishable. Therefore, it is suggested to use nanopatterning (appearing only in the desorption zone) for determination the ablation contour: the sample is illuminated through a proximity standing grid and regions, where a diffraction pattern appears belong to the desorption zone (examples are shown). Since the diffraction pattern is engraved in the “windows of the grid only, a homogeneous nanopatterning with interferometer is proposed. A new type of XUV interferometer is designed and numerically tested.
  • For nanosecond laser pulses the material removal efficiency in the desorption zone spans from 0 to 90% and, hence, it is transition to 100% characteristic for ablation zone is hardly distinguishable. Therefore, it is suggested to use nanopatterning (appearing only in the desorption zone) for determination the ablation contour: the sample is illuminated through a proximity standing grid and regions, where a diffraction pattern appears belong to the desorption zone (examples are shown). Since the diffraction pattern is engraved in the “windows of the grid only, a homogeneous nanopatterning with interferometer is proposed. A new type of XUV interferometer is designed and numerically tested. (en)
Title
  • A new method of determination of ablation threshold contour in the spot of focused XUV laser beam of nanosecond duration
  • A new method of determination of ablation threshold contour in the spot of focused XUV laser beam of nanosecond duration (en)
skos:prefLabel
  • A new method of determination of ablation threshold contour in the spot of focused XUV laser beam of nanosecond duration
  • A new method of determination of ablation threshold contour in the spot of focused XUV laser beam of nanosecond duration (en)
skos:notation
  • RIV/61389021:_____/13:00423048!RIV14-MSM-61389021
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  • I, P(LG13029)
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  • 58824
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  • RIV/61389021:_____/13:00423048
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  • Extreme ultraviolet radiation; XUV interferometer, ablation threshold contour; XUV photodesorption; direct nanopatterningby XUV; application of Ar8+ XUV laser (en)
http://linked.open.../riv/klicoveSlovo
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  • [7C9ABF9D9D95]
http://linked.open...v/mistoKonaniAkce
  • Prague
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  • Bellingham, Washington
http://linked.open...i/riv/nazevZdroje
  • Proceedings of SPIE 8777
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  • Choukourov, A.
  • Melich, Radek
  • Frolov, Oleksandr
  • Koláček, Karel
  • Prukner, Václav
  • Schmidt, Jiří
  • Štraus, Jaroslav
http://linked.open...vavai/riv/typAkce
http://linked.open...ain/vavai/riv/wos
  • 000329577700018
http://linked.open.../riv/zahajeniAkce
issn
  • 0277-786X
number of pages
http://bibframe.org/vocab/doi
  • 10.1117/12.2020261
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  • SPIE Press
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  • 978-0-8194-9579-2
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