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Description
| - For nanosecond laser pulses the material removal efficiency in the desorption zone spans from 0 to 90% and, hence, it is transition to 100% characteristic for ablation zone is hardly distinguishable. Therefore, it is suggested to use nanopatterning (appearing only in the desorption zone) for determination the ablation contour: the sample is illuminated through a proximity standing grid and regions, where a diffraction pattern appears belong to the desorption zone (examples are shown). Since the diffraction pattern is engraved in the “windows of the grid only, a homogeneous nanopatterning with interferometer is proposed. A new type of XUV interferometer is designed and numerically tested.
- For nanosecond laser pulses the material removal efficiency in the desorption zone spans from 0 to 90% and, hence, it is transition to 100% characteristic for ablation zone is hardly distinguishable. Therefore, it is suggested to use nanopatterning (appearing only in the desorption zone) for determination the ablation contour: the sample is illuminated through a proximity standing grid and regions, where a diffraction pattern appears belong to the desorption zone (examples are shown). Since the diffraction pattern is engraved in the “windows of the grid only, a homogeneous nanopatterning with interferometer is proposed. A new type of XUV interferometer is designed and numerically tested. (en)
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Title
| - A new method of determination of ablation threshold contour in the spot of focused XUV laser beam of nanosecond duration
- A new method of determination of ablation threshold contour in the spot of focused XUV laser beam of nanosecond duration (en)
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skos:prefLabel
| - A new method of determination of ablation threshold contour in the spot of focused XUV laser beam of nanosecond duration
- A new method of determination of ablation threshold contour in the spot of focused XUV laser beam of nanosecond duration (en)
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skos:notation
| - RIV/61389021:_____/13:00423048!RIV14-MSM-61389021
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http://linked.open...avai/predkladatel
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http://linked.open...avai/riv/aktivita
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http://linked.open...avai/riv/aktivity
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http://linked.open...vai/riv/dodaniDat
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http://linked.open...aciTvurceVysledku
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http://linked.open.../riv/druhVysledku
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http://linked.open...iv/duvernostUdaju
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http://linked.open...titaPredkladatele
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http://linked.open...dnocenehoVysledku
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http://linked.open...ai/riv/idVysledku
| - RIV/61389021:_____/13:00423048
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http://linked.open...riv/jazykVysledku
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http://linked.open.../riv/klicovaSlova
| - Extreme ultraviolet radiation; XUV interferometer, ablation threshold contour; XUV photodesorption; direct nanopatterningby XUV; application of Ar8+ XUV laser (en)
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http://linked.open.../riv/klicoveSlovo
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http://linked.open...ontrolniKodProRIV
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http://linked.open...v/mistoKonaniAkce
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http://linked.open...i/riv/mistoVydani
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http://linked.open...i/riv/nazevZdroje
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http://linked.open...in/vavai/riv/obor
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http://linked.open...ichTvurcuVysledku
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http://linked.open...cetTvurcuVysledku
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http://linked.open...vavai/riv/projekt
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http://linked.open...UplatneniVysledku
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http://linked.open...iv/tvurceVysledku
| - Choukourov, A.
- Melich, Radek
- Frolov, Oleksandr
- Koláček, Karel
- Prukner, Václav
- Schmidt, Jiří
- Štraus, Jaroslav
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http://linked.open...vavai/riv/typAkce
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http://linked.open...ain/vavai/riv/wos
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http://linked.open.../riv/zahajeniAkce
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issn
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number of pages
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http://bibframe.org/vocab/doi
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https://schema.org/isbn
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