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  • We present a complex study of rare earth elements implanted GaN layers grown by low pressure metalorganic vapor phase epitaxy on c-plane sapphire substrates. Gd, Dy, La and Lu ions were implanted with energies of 200 key and doses ranging from 5 x 10(13) to 4 x 10(17) atoms.cm(-2). The chemical composition and concentration profiles of ion-implanted layers were studied by secondary ion mass spectrometry and Rutherford back scattering. The structural properties of the layers were characterized by Rutherford back scattering/channeling and X-ray diffraction reciprocal space mapping.
  • We present a complex study of rare earth elements implanted GaN layers grown by low pressure metalorganic vapor phase epitaxy on c-plane sapphire substrates. Gd, Dy, La and Lu ions were implanted with energies of 200 key and doses ranging from 5 x 10(13) to 4 x 10(17) atoms.cm(-2). The chemical composition and concentration profiles of ion-implanted layers were studied by secondary ion mass spectrometry and Rutherford back scattering. The structural properties of the layers were characterized by Rutherford back scattering/channeling and X-ray diffraction reciprocal space mapping. (en)
Title
  • Magnetism in GaN layers implanted by La, Gd, Dy and Lu
  • Magnetism in GaN layers implanted by La, Gd, Dy and Lu (en)
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  • Magnetism in GaN layers implanted by La, Gd, Dy and Lu
  • Magnetism in GaN layers implanted by La, Gd, Dy and Lu (en)
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  • RIV/61389005:_____/11:00365408!RIV12-AV0-61389005
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  • P(GA104/09/0621), P(GA104/09/1269), P(GA106/09/0125), Z(AV0Z10100521), Z(AV0Z10480505), Z(MSM6046137302)
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  • 18
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  • 210252
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  • RIV/61389005:_____/11:00365408
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  • Magnetic semiconductors; III-V semiconductors; Ion implantation; X-ray diffraction; Rutherford backscattering spectroscopy (en)
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  • CH - Švýcarská konfederace
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  • 519
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  • Macková, Anna
  • Peřina, Vratislav
  • Maryško, Miroslav
  • Hejtmánek, Jiří
  • Mikulics, M.
  • Sedmidubský, D.
  • Sofer, Z.
  • Buchal, C.
  • Groetzschel, R.
  • Hardtdegen, H.
  • Moram, M.
  • Václavů, M.
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  • 000292576500049
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issn
  • 0040-6090
number of pages
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  • 10.1016/j.tsf.2011.04.110
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