About: Optimization of a bent perfect Si(111) monochromator at a small take-off angle for use in a stress instrument

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An Entity of Type : http://linked.opendata.cz/ontology/domain/vavai/Vysledek, within Data Space : linked.opendata.cz associated with source document(s)

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rdf:type	skos:Concept http://linked.opendata.cz/ontology/domain/vavai/Vysledek
Description	The reflectivity and resolution properties of focusing cylindrically bent perfect crystal Si(111) monochromators of different diffraction geometries were tested with the aim of evaluating their possible use in a stress instrument with an unusually small take-off angle (2 theta(M) similar or equal to 30 degrees). The experiments showed that an Si crystal with reflecting planes (111) in the symmetric diffraction geometry provides a maximum figure of merit for accuracy in the peak position that is comparable to that achieved previously from an optimized Si(220) monochromator at 2 theta(M) similar or equal to 55 degrees. The reflectivity and resolution properties of focusing cylindrically bent perfect crystal Si(111) monochromators of different diffraction geometries were tested with the aim of evaluating their possible use in a stress instrument with an unusually small take-off angle (2 theta(M) similar or equal to 30 degrees). The experiments showed that an Si crystal with reflecting planes (111) in the symmetric diffraction geometry provides a maximum figure of merit for accuracy in the peak position that is comparable to that achieved previously from an optimized Si(220) monochromator at 2 theta(M) similar or equal to 55 degrees. (en)
Title	Optimization of a bent perfect Si(111) monochromator at a small take-off angle for use in a stress instrument Optimization of a bent perfect Si(111) monochromator at a small take-off angle for use in a stress instrument (en)
skos:prefLabel	Optimization of a bent perfect Si(111) monochromator at a small take-off angle for use in a stress instrument Optimization of a bent perfect Si(111) monochromator at a small take-off angle for use in a stress instrument (en)
skos:notation	RIV/61389005:_____/10:00346634!RIV11-GA0-61389005
http://linked.open...avai/riv/aktivita	P Z
http://linked.open...avai/riv/aktivity	P(GAP204/10/0654), Z(AV0Z10480505), Z(MSM2672244501)
http://linked.open...iv/cisloPeriodika	3
http://linked.open...vai/riv/dodaniDat	2011
http://linked.open...aciTvurceVysledku	Šaroun, Jan Mikula, Pavel
http://linked.open.../riv/druhVysledku	J - Článek v odborném periodiku
http://linked.open...iv/duvernostUdaju	S - Úplné a pravdivé údaje nepodléhající ochraně podle zvláštních právních předpisů
http://linked.open...titaPredkladatele	Ústav jaderné fyziky AV ČR, v. v. i.
http://linked.open...dnocenehoVysledku	277348
http://linked.open...ai/riv/idVysledku	RIV/61389005:_____/10:00346634
http://linked.open...riv/jazykVysledku	eng - angličtina
http://linked.open.../riv/klicovaSlova	SENSITIVE NEUTRON DETECTOR; MOSAIC CRYSTALS; DIFFRACTION (en)
http://linked.open.../riv/klicoveSlovo	DIFFRACTION MOSAIC CRYSTALS SENSITIVE NEUTRON DETECTOR
http://linked.open...odStatuVydavatele	GB - Spojené království Velké Británie a Severního Irska
http://linked.open...ontrolniKodProRIV	[DC5D93801022]
http://linked.open...i/riv/nazevZdroje	Journal of Applied Crystallography
http://linked.open...in/vavai/riv/obor	BG
http://linked.open...ichTvurcuVysledku	2 (xsd:int)
http://linked.open...cetTvurcuVysledku	5 (xsd:int)
http://linked.open...vavai/riv/projekt	Monte Carlo simulations of complex neutron optics systems
http://linked.open...UplatneniVysledku	2010
http://linked.open...v/svazekPeriodika	43
http://linked.open...iv/tvurceVysledku	Kang, M. H. Seong, B. S. Šaroun, Jan Mikula, Pavol Em, V.
http://linked.open...ain/vavai/riv/wos	000277392600035
http://linked.open...n/vavai/riv/zamer	Jaderná fyzika a příbuzné obory v základním, aplikovaném a interdisciplinárním výzkumu Basic Research and Oriented Research in Industry and Medicine using Neutron Sources
issn	0021-8898
number of pages	5 (xsd:int)
is http://linked.open...avai/riv/vysledek of	Optimization of a bent perfect Si(111) monochromator at a small take-off angle for use in a stress instrument Optimization of a bent perfect Si(111) monochromator at a small take-off angle for use in a stress instrument Optimization of a bent perfect Si(111) monochromator at a small take-off angle for use in a stress instrument

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