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  • The 50 keV C60+ cluster ions have been applied for modification of the C60 film structure. The modification is found to be sensitive to the ion dose. The cluster ion irradiation with the doses lower than 251014 ions/cm2 leads to formation of the pyramid-like nanodots on the film surface. In parallel, Raman spectra show the C60 quality improvement in solid state suggesting film purification from the small CxHy radicals. The irradiation with the doses higher than 251014 ions/cm2 activates evident carbon sputtering. The high-dose irradiation also drastically changes the surface nano-pattern yielding the aligned elongated nano-objects. Raman and AFM analysis identifies the nano-objects as the C60 polymeric chains. Formation of the C60 polymeric chains is referred to the effect of shockwaves generated by the C60+ cluster impacts.
  • The 50 keV C60+ cluster ions have been applied for modification of the C60 film structure. The modification is found to be sensitive to the ion dose. The cluster ion irradiation with the doses lower than 251014 ions/cm2 leads to formation of the pyramid-like nanodots on the film surface. In parallel, Raman spectra show the C60 quality improvement in solid state suggesting film purification from the small CxHy radicals. The irradiation with the doses higher than 251014 ions/cm2 activates evident carbon sputtering. The high-dose irradiation also drastically changes the surface nano-pattern yielding the aligned elongated nano-objects. Raman and AFM analysis identifies the nano-objects as the C60 polymeric chains. Formation of the C60 polymeric chains is referred to the effect of shockwaves generated by the C60+ cluster impacts. (en)
Title
  • Fullerene nanostructure design with cluster ion impacts
  • Fullerene nanostructure design with cluster ion impacts (en)
skos:prefLabel
  • Fullerene nanostructure design with cluster ion impacts
  • Fullerene nanostructure design with cluster ion impacts (en)
skos:notation
  • RIV/61389005:_____/09:00336186!RIV10-AV0-61389005
http://linked.open...avai/riv/aktivita
http://linked.open...avai/riv/aktivity
  • P(IAA200480702), P(IAA400100701), P(KAN400480701), Z(AV0Z10480505)
http://linked.open...iv/cisloPeriodika
  • -
http://linked.open...vai/riv/dodaniDat
http://linked.open...aciTvurceVysledku
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http://linked.open...dnocenehoVysledku
  • 315689
http://linked.open...ai/riv/idVysledku
  • RIV/61389005:_____/09:00336186
http://linked.open...riv/jazykVysledku
http://linked.open.../riv/klicovaSlova
  • fullerene films, clusters C60+; cluster ion implantation; patterning (en)
http://linked.open.../riv/klicoveSlovo
http://linked.open...odStatuVydavatele
  • NL - Nizozemsko
http://linked.open...ontrolniKodProRIV
  • [434D145C7757]
http://linked.open...i/riv/nazevZdroje
  • Journal of Alloys and Compounds
http://linked.open...in/vavai/riv/obor
http://linked.open...ichTvurcuVysledku
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http://linked.open...vavai/riv/projekt
http://linked.open...UplatneniVysledku
http://linked.open...v/svazekPeriodika
  • 483
http://linked.open...iv/tvurceVysledku
  • Lavrentiev, Vasyl
  • Vacík, Jiří
  • Narumi, K.
  • Naramoto, H.
http://linked.open...ain/vavai/riv/wos
  • 000270619600115
http://linked.open...n/vavai/riv/zamer
issn
  • 0925-8388
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