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  • Předmětem studia práce byla difúze 6Li v Ta a W. Vzorky byly připraveny iontovou implantací izotopu 6Li (380 keV) do tenkých fóliích Ta a W (s fluencí až 1E16 cm-2) a žíháním až do teplot 1940 C. Hloubkové profily 6Li byly určovány pomocí metody neutronového hloubkového profilování. Výsledky ukázaly, že difúze 6Li v Ta a W je velmi komplikovaná a nemůže být popsána jednoduchými Fickovými zákony. Pro vysvětlení difúzního chování izotopu 6Li v povrchových vrstvách Ta a W bylo nutné předpokládat existenci tzv. záchytových center. Tím však nebylo možné objasnit komplikované difúzní chování 6Li v Ta a W úplně. K tomu je bude nutné vzít do úvahy i další aspekty jako např. hloubkově závislé difúzní koeficienty aj. (cs)
  • The objective of this work was the study of 6Li diffusion in the Ta and W refractory metals. The samples were prepared by ion implantation of 380 keV 6Li ions into W and Ta thin foils (up to the fluence of 1E16 ions/cm2) and annealed up to the temperature 1940 C. The depth profiles of 6Li were determined using the Thermal Neutron Depth Profiling (TNDP) technique. The results showed that diffusion of 6Li in both W and Ta foils is very complex and cannot be described by simple Fick’s laws. Trapping centers (in the subsurface layers of both W and Ta metals) were supposed in a trial to explain the 6Li diffusion behavior. However, the 6Li depth profiles were only partly explained. Other aspects are necessary to take into account for more proper quantification; such as spatially dependent diffusion coefficients, etc.
  • The objective of this work was the study of 6Li diffusion in the Ta and W refractory metals. The samples were prepared by ion implantation of 380 keV 6Li ions into W and Ta thin foils (up to the fluence of 1E16 ions/cm2) and annealed up to the temperature 1940 C. The depth profiles of 6Li were determined using the Thermal Neutron Depth Profiling (TNDP) technique. The results showed that diffusion of 6Li in both W and Ta foils is very complex and cannot be described by simple Fick’s laws. Trapping centers (in the subsurface layers of both W and Ta metals) were supposed in a trial to explain the 6Li diffusion behavior. However, the 6Li depth profiles were only partly explained. Other aspects are necessary to take into account for more proper quantification; such as spatially dependent diffusion coefficients, etc. (en)
Title
  • Diffusion of 6Li in Ta and W
  • Diffusion of 6Li in Ta and W (en)
  • Difúze 6Li v Ta a W (cs)
skos:prefLabel
  • Diffusion of 6Li in Ta and W
  • Diffusion of 6Li in Ta and W (en)
  • Difúze 6Li v Ta a W (cs)
skos:notation
  • RIV/61389005:_____/06:00040559!RIV07-AV0-61389005
http://linked.open.../vavai/riv/strany
  • 865;868
http://linked.open...avai/riv/aktivita
http://linked.open...avai/riv/aktivity
  • P(1H-PK2/05), P(GA202/05/0410), Z(AV0Z10480505), Z(MSM2672244501)
http://linked.open...iv/cisloPeriodika
  • 1-2
http://linked.open...vai/riv/dodaniDat
http://linked.open...aciTvurceVysledku
http://linked.open.../riv/druhVysledku
http://linked.open...iv/duvernostUdaju
http://linked.open...titaPredkladatele
http://linked.open...dnocenehoVysledku
  • 471675
http://linked.open...ai/riv/idVysledku
  • RIV/61389005:_____/06:00040559
http://linked.open...riv/jazykVysledku
http://linked.open.../riv/klicovaSlova
  • diffusion; thermal neutron depth profiling; isotope separation on-line (en)
http://linked.open.../riv/klicoveSlovo
http://linked.open...odStatuVydavatele
  • NL - Nizozemsko
http://linked.open...ontrolniKodProRIV
  • [47AB162A7731]
http://linked.open...i/riv/nazevZdroje
  • Nuclear Instruments and Methods in Physical Research. B
http://linked.open...in/vavai/riv/obor
http://linked.open...ichTvurcuVysledku
http://linked.open...cetTvurcuVysledku
http://linked.open...vavai/riv/projekt
http://linked.open...UplatneniVysledku
http://linked.open...v/svazekPeriodika
  • 249
http://linked.open...iv/tvurceVysledku
  • Hnatowicz, Vladimír
  • Havránek, Vladimír
  • Vacík, Jiří
  • Koster, U.
  • Pasold, G.
  • Červená, Jarmila
http://linked.open...n/vavai/riv/zamer
issn
  • 0168-583X
number of pages
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