About: Decontamination of Sulfur Mustard from Printed Circuit Board Using Zr-Doped Titania Suspension

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An Entity of Type : http://linked.opendata.cz/ontology/domain/vavai/Vysledek, within Data Space : linked.opendata.cz associated with source document(s)

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rdf:type	skos:Concept http://linked.opendata.cz/ontology/domain/vavai/Vysledek
Description	We present a procedure for removal and detoxification of chemical warfare agents (CWA) from corrosion-sensitive components using their reactive sorption (adsorption and bond cleavage). The procedure consists of spraying a suspended sorbent over a contaminated surface followed by mechanical removal of the spent sorbent after liquid phase evaporation. The procedure was tested using a video graphics array (VGA computer card) VGA card, sulfur mustard (yperite, HD agent, bis(2-chloroethyl)sulfide), and Zr4+-doped TiO2 sorbent obtained by homogeneous hydrolysis. After 60 min of interaction with a suspension of the reactive sorbent with the contaminated VGA card, 99.3% of the sulfur mustard was removed, while the VGA card retained its functionality. The procedure does not require specialized instrumentation. This is feasible for electronic devices, as they do not need corrosive and electrically conducting agents or nonvolatile solvents that would harm electronic circuits. The method would be applicable to decontamination of a broad range of CWAs and pesticides. We present a procedure for removal and detoxification of chemical warfare agents (CWA) from corrosion-sensitive components using their reactive sorption (adsorption and bond cleavage). The procedure consists of spraying a suspended sorbent over a contaminated surface followed by mechanical removal of the spent sorbent after liquid phase evaporation. The procedure was tested using a video graphics array (VGA computer card) VGA card, sulfur mustard (yperite, HD agent, bis(2-chloroethyl)sulfide), and Zr4+-doped TiO2 sorbent obtained by homogeneous hydrolysis. After 60 min of interaction with a suspension of the reactive sorbent with the contaminated VGA card, 99.3% of the sulfur mustard was removed, while the VGA card retained its functionality. The procedure does not require specialized instrumentation. This is feasible for electronic devices, as they do not need corrosive and electrically conducting agents or nonvolatile solvents that would harm electronic circuits. The method would be applicable to decontamination of a broad range of CWAs and pesticides. (en)
Title	Decontamination of Sulfur Mustard from Printed Circuit Board Using Zr-Doped Titania Suspension Decontamination of Sulfur Mustard from Printed Circuit Board Using Zr-Doped Titania Suspension (en)
skos:prefLabel	Decontamination of Sulfur Mustard from Printed Circuit Board Using Zr-Doped Titania Suspension Decontamination of Sulfur Mustard from Printed Circuit Board Using Zr-Doped Titania Suspension (en)
skos:notation	RIV/61388980:_____/13:00392122!RIV14-AV0-61388980
http://linked.open...avai/predkladatel	Ústav anorganické chemie AV ČR, v.v.i.
http://linked.open...avai/riv/aktivita	I
http://linked.open...avai/riv/aktivity	I
http://linked.open...iv/cisloPeriodika	9
http://linked.open...vai/riv/dodaniDat	2014
http://linked.open...aciTvurceVysledku	Grygar, Tomáš Štengl, Václav
http://linked.open.../riv/druhVysledku	J - Článek v odborném periodiku
http://linked.open...iv/duvernostUdaju	S - Úplné a pravdivé údaje nepodléhající ochraně podle zvláštních právních předpisů
http://linked.open...titaPredkladatele	Ústav anorganické chemie AV ČR, v. v. i.
http://linked.open...dnocenehoVysledku	68109
http://linked.open...ai/riv/idVysledku	RIV/61388980:_____/13:00392122
http://linked.open...riv/jazykVysledku	eng - angličtina
http://linked.open.../riv/klicovaSlova	chemical warfare agents; nanofiber membranes; manganese oxide; metal-oxides (en)
http://linked.open.../riv/klicoveSlovo	metal-oxides nanofiber membranes chemical warfare agents manganese oxide
http://linked.open...odStatuVydavatele	US - Spojené státy americké
http://linked.open...ontrolniKodProRIV	[AE300BD445B3]
http://linked.open...i/riv/nazevZdroje	Industrial and Engineering Chemistry Research
http://linked.open...in/vavai/riv/obor	CA
http://linked.open...ichTvurcuVysledku	2 (xsd:int)
http://linked.open...cetTvurcuVysledku	4 (xsd:int)
http://linked.open...UplatneniVysledku	2013
http://linked.open...v/svazekPeriodika	52
http://linked.open...iv/tvurceVysledku	Matys Grygar, Tomáš Štengl, Václav Opluštil, F. Olšanská, M.
http://linked.open...ain/vavai/riv/wos	000315937000035
issn	0888-5885
number of pages	5 (xsd:int)
http://bibframe.org/vocab/doi	10.1021/ie302711u

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