About: The structure and growth mechanism of Si nanoneedles prepared by plasma-enhanced chemical vapor deposition

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About: The structure and growth mechanism of Si nanoneedles prepared by plasma-enhanced chemical vapor deposition Goto Sponge NotDistinct Permalink

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rdf:type	skos:Concept http://linked.opendata.cz/ontology/domain/vavai/Vysledek
Description	Silicon nanowires and nanoneedles show promise for many device applications in nanoelectronics and nanophotonics, but the remaining challenge is to grow them at low temperatures on low-cost materials. Here we present plasma-enhanced chemical vapor deposition of crystalline/amorphous Si nanoneedles on glass at temperatures as low as 250 °C. High resolution electron microscopy and micro-Raman spectroscopy have been used to study the crystal structure and the growth mechanism of individual Si nanoneedles. The H2 dilution of the SiH4 plasma working gas has caused the formation of extremely sharp nanoneedle tips that in some cases do not contain a catalytic particle at the end. Silicon nanowires and nanoneedles show promise for many device applications in nanoelectronics and nanophotonics, but the remaining challenge is to grow them at low temperatures on low-cost materials. Here we present plasma-enhanced chemical vapor deposition of crystalline/amorphous Si nanoneedles on glass at temperatures as low as 250 °C. High resolution electron microscopy and micro-Raman spectroscopy have been used to study the crystal structure and the growth mechanism of individual Si nanoneedles. The H2 dilution of the SiH4 plasma working gas has caused the formation of extremely sharp nanoneedle tips that in some cases do not contain a catalytic particle at the end. (en)
Title	The structure and growth mechanism of Si nanoneedles prepared by plasma-enhanced chemical vapor deposition The structure and growth mechanism of Si nanoneedles prepared by plasma-enhanced chemical vapor deposition (en)
skos:prefLabel	The structure and growth mechanism of Si nanoneedles prepared by plasma-enhanced chemical vapor deposition The structure and growth mechanism of Si nanoneedles prepared by plasma-enhanced chemical vapor deposition (en)
skos:notation	RIV/61388980:_____/10:00352722!RIV11-MSM-61388980
http://linked.open...avai/riv/aktivita	P Z
http://linked.open...avai/riv/aktivity	P(KAN400100701), P(LC06040), P(LC510), Z(AV0Z10100521), Z(AV0Z40320502)
http://linked.open...iv/cisloPeriodika	41
http://linked.open...vai/riv/dodaniDat	2011
http://linked.open...aciTvurceVysledku	Bakardjieva, Snejana
http://linked.open.../riv/druhVysledku	J - Článek v odborném periodiku
http://linked.open...iv/duvernostUdaju	S - Úplné a pravdivé údaje nepodléhající ochraně podle zvláštních právních předpisů
http://linked.open...titaPredkladatele	Ústav anorganické chemie AV ČR, v. v. i.
http://linked.open...dnocenehoVysledku	290467
http://linked.open...ai/riv/idVysledku	RIV/61388980:_____/10:00352722
http://linked.open...riv/jazykVysledku	eng - angličtina
http://linked.open.../riv/klicovaSlova	nanoneedles; nanowires; silicon; plasma; chemical vapor deposition; crystal structure; growth; phonon; SEM; Raman (en)
http://linked.open.../riv/klicoveSlovo	SEM Raman crystal structure growth plasma silicon nanowires chemical vapor deposition phonon nanoneedles
http://linked.open...odStatuVydavatele	GB - Spojené království Velké Británie a Severního Irska
http://linked.open...ontrolniKodProRIV	[E9D0A3004E5A]
http://linked.open...i/riv/nazevZdroje	Nanotechnology
http://linked.open...in/vavai/riv/obor	BM
http://linked.open...ichTvurcuVysledku	1 (xsd:int)
http://linked.open...cetTvurcuVysledku	8 (xsd:int)
http://linked.open...vavai/riv/projekt	Center of nanotechnology and materials for nanoelectronics Functional hybrid nanosystems of semiconductors and metals with organic materials (FUNS) Structures for Nanophotonics and Nanoelectronics
http://linked.open...UplatneniVysledku	2010
http://linked.open...v/svazekPeriodika	21
http://linked.open...iv/tvurceVysledku	Hruška, Karel Ledinský, Martin Fejfar, Antonín Stuchlík, Jiří Bakardjieva, Snejana Kočka, Jan Stuchlíková, The-Ha Červenka, Jiří
http://linked.open...ain/vavai/riv/wos	000281958600017
http://linked.open...n/vavai/riv/zamer	Physics and technology of nanostructures, surfaces and thin films Design, syntéza a charakterizace klastrů, kompozitů, komplexů a dalších sloučenin na bázi anorganických látek; mechanismy a kinetika jejich interakcí
issn	0957-4484
number of pages	7 (xsd:int)
is http://linked.open...avai/riv/vysledek of	The structure and growth mechanism of Si nanoneedles prepared by plasma-enhanced chemical vapor deposition The structure and growth mechanism of Si nanoneedles prepared by plasma-enhanced chemical vapor deposition The structure and growth mechanism of Si nanoneedles prepared by plasma-enhanced chemical vapor deposition

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