About: Thin Nickel Oxide Layers Prepared by Reactive Ion Beam Sputtering: Fabrication and the Study of Electrophysical Parameters

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Description	Thin nickel oxide layers (thickness ca 50 and 100 nm) for sensorics were fabricated by ion beam sputtering method with subsequent annealing. Ion beam formed from a mixture of argon and oxygen was used to sputter the nickel foil. Different volume ratios of argon:oxygen in mixture were used, ranging from 1:0 to 1:4. Deposited layers were characterized in as-deposited state and after annealing at temperature of 400°C. The study of electrophysical properties (sheet resistance, mobility and concentration of charge carriers) was performed by four point Van der Pauw technique and Hall measurements respectively. Hall measurements revealed majority charge carriers to be electrons. For as-deposited layers electron surface concentration decreases with increasing amount of oxygen in ion beam and is in range (5 - 23) x 10^20 m^-2 for above mentioned range of argon:oxygen ratios. According to this trend the sheet resistance of the layers increases with higher amount of oxygen in ion beam in the interval of values (40 - 420) ohm/. Thin nickel oxide layers (thickness ca 50 and 100 nm) for sensorics were fabricated by ion beam sputtering method with subsequent annealing. Ion beam formed from a mixture of argon and oxygen was used to sputter the nickel foil. Different volume ratios of argon:oxygen in mixture were used, ranging from 1:0 to 1:4. Deposited layers were characterized in as-deposited state and after annealing at temperature of 400°C. The study of electrophysical properties (sheet resistance, mobility and concentration of charge carriers) was performed by four point Van der Pauw technique and Hall measurements respectively. Hall measurements revealed majority charge carriers to be electrons. For as-deposited layers electron surface concentration decreases with increasing amount of oxygen in ion beam and is in range (5 - 23) x 10^20 m^-2 for above mentioned range of argon:oxygen ratios. According to this trend the sheet resistance of the layers increases with higher amount of oxygen in ion beam in the interval of values (40 - 420) ohm/. (en)
Title	Thin Nickel Oxide Layers Prepared by Reactive Ion Beam Sputtering: Fabrication and the Study of Electrophysical Parameters Thin Nickel Oxide Layers Prepared by Reactive Ion Beam Sputtering: Fabrication and the Study of Electrophysical Parameters (en)
skos:prefLabel	Thin Nickel Oxide Layers Prepared by Reactive Ion Beam Sputtering: Fabrication and the Study of Electrophysical Parameters Thin Nickel Oxide Layers Prepared by Reactive Ion Beam Sputtering: Fabrication and the Study of Electrophysical Parameters (en)
skos:notation	RIV/60461373:22340/12:43893929!RIV13-MSM-22340___
http://linked.open...avai/predkladatel	Fakulta chemicko-inženýrská
http://linked.open...avai/riv/aktivita	S
http://linked.open...avai/riv/aktivity	S
http://linked.open...vai/riv/dodaniDat	2013
http://linked.open...aciTvurceVysledku	Khun, Josef Horák, Pavel Vrňata, Martin
http://linked.open.../riv/druhVysledku	D - Článek ve sborníku
http://linked.open...iv/duvernostUdaju	S - Úplné a pravdivé údaje nepodléhající ochraně podle zvláštních právních předpisů
http://linked.open...titaPredkladatele	Vysoká škola chemicko-technologická v Praze / Fakulta chemicko-inženýrská
http://linked.open...dnocenehoVysledku	174347
http://linked.open...ai/riv/idVysledku	RIV/60461373:22340/12:43893929
http://linked.open...riv/jazykVysledku	eng - angličtina
http://linked.open.../riv/klicovaSlova	Nickel oxide, Ion Beam Sputtering, van der Pauw (en)
http://linked.open.../riv/klicoveSlovo	van der Pauw Ion Beam Sputtering Nickel oxide
http://linked.open...ontrolniKodProRIV	[4FA502783C49]
http://linked.open...v/mistoKonaniAkce	Brno
http://linked.open...i/riv/mistoVydani	Ostrava
http://linked.open...i/riv/nazevZdroje	NANOCON 2012 Conference Proceedings 4th International conference
http://linked.open...in/vavai/riv/obor	BM
http://linked.open...ichTvurcuVysledku	3 (xsd:int)
http://linked.open...cetTvurcuVysledku	6 (xsd:int)
http://linked.open...UplatneniVysledku	2012
http://linked.open...iv/tvurceVysledku	Horák, Pavel Khun, Josef Vacík, Jiří Vrňata, Martin Bejšovec, Václav Lavrentiev, Vasily
http://linked.open...vavai/riv/typAkce	WRD - Světová
http://linked.open.../riv/zahajeniAkce	2012-10-23 (xsd:date)
number of pages	6 (xsd:int)
http://purl.org/ne...btex#hasPublisher	TANGER
https://schema.org/isbn	978-80-87294-32-1
http://localhost/t...ganizacniJednotka	22340
is http://linked.open...avai/riv/vysledek of	Thin Nickel Oxide Layers Prepared by Reactive Ion Beam Sputtering: Fabrication and the Study of Electrophysical Parameters

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